Y10S 522/914
Wavelength of 200 nanometers or less
Y10S522/914 (Wavelength of 200 nanometers or less) appears on 10 US grants and 4 published applications in this corpus.
Search patents in Y10S- Granted patents
- 10
- Published applications
- 4
- Assignees
- 8
- Inventors
- 20
- Latest grant
- 3 Aug 2010
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 1 | 0 |
| 2005 | 1 | 2 |
| 2006 | 0 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 0 |
| 2010 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Autoxidisable architectural coating compositions3 Aug 2010US 7,767,727 B2Imperial Chemical Industries PLC
- Enabling chain scission of branched photoresist23 Jan 2007US 7,166,413 B2Intel Corporation
- Enabling chain scission of branched photoresist29 Mar 2005US 6,872,505 B1Intel Corporation
- Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition8 Jun 2004US 6,746,722 B2NEC Corporation
- Preparation of perfluorooligoether iodides22 Feb 1994US 5,288,376 AShin-Etsu Chemical Co., Ltd.
- Autoxidisable Architectural Coating Compositions7 Aug 2008US 2008/0188584 A1Imperial Chemical Industries PLC
- Enabling chain scission of branched photoresist19 May 2005US 2005/0106498 A1Intel Corporation
- Enabling chain scission of branched photoresist17 Mar 2005US 2005/0058931 A1Intel Corporation
- Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition20 Feb 2003US 2003/0036618 A1NEC Corporation
Most cited
By later US patents
- Process for the photochemical vapor deposition of siloxane polymers28US 4,781,942 AHughes Aircraft Company · 1988
- Ultraviolet light assisted fluorination of polymer surfaces21US 4,593,050 AMassachusetts Institute of Technology · 1986
- Process for making a reverse image using a pigmented peel-apart photosensitive element containing a photoinhibitor16US 4,923,780 AE. I. Du Pont de Nemours and Company · 1990
- Preparation of perfluorooligoether iodides6US 5,288,376 AShin-Etsu Chemical Co., Ltd. · 1994
- Method for the improvement of a gramophone record4US 4,307,045 AShin-Etsu Chemical Co., Ltd. · 1981