Process for making a reverse image using a pigmented peel-apart photosensitive element containing a photoinhibitor
AssigneeE. I. Du Pont de Nemours and Company
InventorHarvey W. Taylor, Jr.
Life of this patent
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Abstract
This invention relates to a process for preparing a reverse image using a pigmented peel-apart element containing a photoinhibitor. More particularly this invention relates to a process for preparing a negative or reverse surprint proof using peel-apart photosensitive elements comprising a strippable cover sheet; a photoadherent layer containing a colorant and a photoinhibitor compound; a tacky, essentially nonphotosensitive contiguous layer; and a support.
Claims12
A process for producing a negative or reverse image on a multilayer peel-apart photosensitive element, comprising, in the stated order, the steps of:
- (1) providing a multilayer peel-apart photosensitive element, comprising, in order from top to bottom,
- (a) a strippable cover sheet comprised of a polymeric film which is transparent to actinic radiation,
- (b) a photoadherent layer comprising a photohardenable material with ethylenically unsaturated groups, an o-nitroaromatic photoinhibitor compound, a free-radical generating photoinitiator or photoinitiator system activatable by actinic radiation of wavelength(s) greater than 380 nm, and a colorant, and
- (c) an essentially nonphotosensitive organic contiguous layer;
- wherein, after exposure to actinic radiation substantially limited to wavelengths greater than about 380 nm, the peel force required to remove the cover sheet (a) with the exposed photoadherent layer (b) thereon from the contiguous layer (c) is at least four times the peel force required to remove the cover sheet (a) from the unexposed photoadherent layer (b),
- (2) exposing the multilayer peel-apart element through an image-bearing transparency to actinic radiation substantially limited to wavelengths of about 200 to about 380 nm, whereby a polymerization inhibitor is formed in the areas of the photoadherent layer struck by the radiation;
- (3) exposing the element overall to actinic radiation substantially limited to wavelengths greater than 380 nm, whereby the areas of the photoadherent layer unexposed in step (2) are polymerized;
- (4) peeling the cover sheet (a) from the photoadherent layer (b), whereby the areas of the photoadherent layer exposed in step (2) remain on the contiguous layer (c) as a negative or reverse image of the transparency used.
Dependencies are inferred from the claim text.