Y10S 427/101

Liquid source chemical depostion, i.e. lscvd or aerosol chemical vapor deposition, i.e.

Official title: Liquid Source Chemical Depostion, i.e. LSCVD or Aerosol Chemical Vapor Deposition, i.e. ACVD

Y10S427/101 (Liquid source chemical depostion, i.e. lscvd or aerosol chemical vapor deposition, i.e.) appears on 39 US grants and 12 published applications in this corpus.

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Granted patents
39
Published applications
12
Assignees
24
Inventors
67
Latest grant
28 Apr 2015

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Y10S 427/101: granted patents and published applications per publication year
YearGranted patentsPublished applications
199110
199200
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199410
199520
199620
199720
199810
199920
200060
200131
200231
200352
200410
200512
200621
200710
200800
200912
201011
201100
201210
201311
201411
201510

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