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  2. /Y · General tagging of new technological developments
  3. /Y10 · Technical subjects covered by former uspc
  4. /Y10S · Technical subjects covered by former uspc cross-reference art collections [xracs] and digests
  5. /Y10S 148/00 · Metal treatment
  6. /Y10S 148/075
Y10S 148/075

Imide resists

Y10S148/075 (Imide resists) appears on 8 US grants and 0 published applications in this corpus.

Search patents in Y10S

Where it sits

  1. YGeneral tagging of new technological developments
  2. Y10Technical subjects covered by former uspc
  3. Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests
  4. Y10S 148/00Metal treatment
  5. Y10S 148/075Imide resists
Granted patents
8
Published applications
0
Assignees
6
Inventors
18
Latest grant
16 Dec 2003

Filings by year

Granted patentsPublished applications
Y10S 148/075: granted patents and published applications per publication year
YearGranted patentsPublished applications
198510
198630
198700
198800
198900
199000
199120
199200
199310
199400
199500
199600
199700
199800
199900
200000
200100
200200
200310

198519952003

By publication year. Applications have been published since 2001.

Recent patents

  • Method of manufacturing a semiconductor component and polyimide etchant therefor16 Dec 2003US 6,664,200 B1
  • Polyimide process for protecting integrated circuits7 Sep 1993US 5,242,864 AIntel Corporation
  • High temperature lift-off process9 Apr 1991US 5,006,488 AInternational Business Machines Corporation
  • Self-aligned dielectric assisted planarization process26 Feb 1991US 4,996,165 ARockwell International Corporation
  • Method of manufacturing a solid-state image pickup device2 Sep 1986US 4,608,749 AKabushiki Kaisha Toshiba

No published applications in this class yet.

Most cited

By later US patents
  • Self-aligned dielectric assisted planarization process134US 4,996,165 ARockwell International Corporation · 1991
  • Trench etch process for dielectric isolation44US 4,534,826 AIBM Corporation · 1985
  • Method of manufacturing a solid-state image pickup device23US 4,608,749 AKabushiki Kaisha Toshiba · 1986
  • Polyimide process for protecting integrated circuits21US 5,242,864 AIntel Corporation · 1993
  • Interdigitated IMPATT devices17US 4,596,070 ATexas Instruments Incorporated · 1986

Top assignees

Documents
  • Texas Instruments Incorporated2
  • IBM Corporation1
  • Intel Corporation1
  • International Business Machines Corporation1
  • Kabushiki Kaisha Toshiba1
  • RIRockwell International Corporation1

Often classified with

  • H10PGeneric processes or apparatus for the manufacture or treatment of devices covered5
  • H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by5
  • H10DInorganic electric semiconductor devices3
  • C08JWorking-up1
  • H10FSolar cells and light sensors1

Documents that also carry the other class.

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