Y10S 148/017
Clean surfaces
Y10S148/017 (Clean surfaces) appears on 108 US grants and 1 published applications in this corpus.
Search patents in Y10S- Granted patents
- 108
- Published applications
- 1
- Assignees
- 61
- Inventors
- 233
- Latest grant
- 11 Aug 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 8 | 0 |
| 1977 | 3 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 3 | 0 |
| 1987 | 6 | 0 |
| 1988 | 2 | 0 |
| 1989 | 7 | 0 |
| 1990 | 7 | 0 |
| 1991 | 9 | 0 |
| 1992 | 9 | 0 |
| 1993 | 11 | 0 |
| 1994 | 15 | 0 |
| 1995 | 7 | 0 |
| 1996 | 7 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Methods for cleaning distilling columns11 Aug 2015US 9,102,604 B1Baxter Healthcare S. A.
- CVD apparatus18 Feb 2003US 6,520,189 B1Semiconductor Energy Laboratory Co.Ltd.
- In situ method for cleaning silicon surface and forming layer thereon in same chamber6 Mar 2001US 6,197,694 B1APPLIED Materials.Inc.
- CVD apparatus11 Jan 2000US 6,013,338 ASemiconductor Energy Laboratory Co.Ltd.
- Method of producing a bipolar transistor20 Jul 1999US 5,925,574 ASeiko Instruments Inc.
Most cited
By later US patents
- Method and apparatus for depositing a layer on a substrate364US 5,294,572 AASM International N.V. · 1994
- Low-temperature in-situ dry cleaning process for semiconductor wafers362US 5,089,441 ATexas Instruments Incorporated · 1992
- Method of depositing films using photo-CVD with chamber plasma cleaning360US 4,950,624 ASemiconductor Energy Laboratory Co.Ltd. · 1990
- In situ method for cleaning silicon surface and forming layer thereon in same chamber279US 5,352,636 AAPPLIED Materials.Inc. · 1994
- Method for etching an SiO.sub.2 film278US 5,328,558 ATokyo Electron Limited · 1994