H01J 37/266
Measurement of magnetic or electric fields in the object
Official title: {Measurement of magnetic or electric fields in the object; Lorentzmicroscopy (spot analysing H01J37/252; emission microscopes H01J37/285; reflecting microscopes H01J37/29)}
H01J37/266 (Measurement of magnetic or electric fields in the object) appears on 149 US grants and 97 published applications in this corpus.
Search patents in H01J- Granted patents
- 149
- Published applications
- 97
- Assignees
- 65
- Inventors
- 276
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 4 | 0 |
| 1986 | 3 | 0 |
| 1987 | 6 | 0 |
| 1988 | 7 | 0 |
| 1989 | 9 | 0 |
| 1990 | 6 | 0 |
| 1991 | 4 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 3 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 2 |
| 2002 | 2 | 2 |
| 2003 | 7 | 5 |
| 2004 | 0 | 2 |
| 2005 | 3 | 6 |
| 2006 | 2 | 1 |
| 2007 | 4 | 3 |
| 2008 | 3 | 6 |
| 2009 | 2 | 2 |
| 2010 | 4 | 4 |
| 2011 | 3 | 1 |
| 2012 | 2 | 2 |
| 2013 | 3 | 2 |
| 2014 | 2 | 3 |
| 2015 | 2 | 2 |
| 2016 | 2 | 0 |
| 2017 | 2 | 5 |
| 2018 | 2 | 9 |
| 2019 | 10 | 7 |
| 2020 | 8 | 7 |
| 2021 | 5 | 8 |
| 2022 | 4 | 6 |
| 2023 | 5 | 5 |
| 2024 | 3 | 3 |
| 2025 | 6 | 3 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Information processing system and phase analysis system7 Jul 2026US 12,676,287 B2Hitachi, Ltd.
- High voltage power supplies for fast voltage changes21 Apr 2026US 12,609,271 B2Advanced Energy Industries, Inc.
- Systems and methods for charged particle flooding to enhance voltage contrast defect signal9 Dec 2025US 12,494,342 B2ASML Netherlands B. V.
- Charged particle beam device26 Aug 2025US 12,400,827 B2Hitachi High-Tech Corporation
- Charged particle beam apparatus and image adjustment method15 Jul 2025US 12,362,134 B2JEOL Ltd.
- Conductive fixation for electron microscopy12 Feb 2026US 2026/0045445 A1University of Kansas
- Systems and methods for voltage contrast defect detection26 Jun 2025US 2025/0208074 A1ASML Netherlands B. V.
- Method for voltage contrast imaging with a corpuscular multi-beam microscope, corpuscular multi-beam microscope for voltage contrast imaging and semiconductor structures for voltage contrast imaging with a corpuscular multi-beam microscope26 Jun 2025US 2025/0210302 A1
- High voltage power supplies for fast voltage changes17 Apr 2025US 2025/0125117 A1Advanced Energy Industries, Inc.
- Systems and methods for charged particle flooding to enhance voltage contrast defect signal14 Nov 2024US 2024/0379325 A1ASML Netherlands B. V.
Most cited
By later US patents
- Microstructure defect detection182US 6,232,787 B1Schlumberger Technologies, Inc. · 2001
- Charged particle beam system110US 8,304,725 B2Hitachi High-Technologies Corporation · 2012
- Multi beam charged particle device101US 6,943,349 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2005
- Scanning electron microscope90US 5,872,358 AHitachi, Ltd. · 1999
- Scanning electron microscope52US 5,900,629 AHitachi, Ltd. · 1999