H01J 37/165
Means associated with the vessel for preventing the generation of or for
Official title: {Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays}
H01J37/165 (Means associated with the vessel for preventing the generation of or for) appears on 31 US grants and 43 published applications in this corpus.
Search patents in H01J- Granted patents
- 31
- Published applications
- 43
- Assignees
- 29
- Inventors
- 121
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2003 | 0 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 1 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 3 |
| 2016 | 2 | 2 |
| 2017 | 2 | 3 |
| 2018 | 2 | 3 |
| 2019 | 5 | 2 |
| 2020 | 4 | 3 |
| 2021 | 3 | 3 |
| 2022 | 1 | 1 |
| 2023 | 2 | 6 |
| 2024 | 3 | 4 |
| 2025 | 1 | 6 |
| 2026 | 4 | 2 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam devices and membrane assemblies useful therein7 Jul 2026US 12,676,280 B2Airsem Technologies Ltd.
- Charged particle beam apparatus28 Apr 2026US 12,614,692 B2Hitachi High-Tech Corporation
- Concentrated solar irradiation of targets in plasmas10 Mar 2026US 12,573,587 B2National Technology & Engineering Solutions of Sandia, LLC
- Process apparatus including differential pumping device and focused ion beam column27 Jan 2026US 12,537,164 B2V Technology Co., Ltd.
- Microwave driven plasma ion source21 Jan 2025US 12,207,383 B2Tofwerk AG
- Charged particle beam devices and membrane assemblies useful therein8 Oct 2026US 2026/0311957 A1Airsem Technologies Ltd.
- Spectroscopy-based safety system for nuclear reaction detection in an ion implantation system30 Apr 2026US 2026/0120994 A1Axcelis Technologies, Inc.
- Black body surface generation using laser material processing18 Dec 2025US 2025/0385068 A1APPLIED Materials.Inc.
- Electrically conductive ceramic electric field blocking plate20 Nov 2025US 2025/0357073 A1APPLIED Materials.Inc.
- Semiconductor radioactive wafer decay safety and operation system16 Oct 2025US 2025/0323007 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Hall effect enhanced capacitively coupled plasma source12US 9,230,780 B2APPLIED Materials.Inc. · 2016
- Shielded, transmission-target, x-ray tube5US 10,453,643 B2Moxtek, Inc. · 2019
- XRF analyzer5US 9,775,574 B2Moxtek, Inc. · 2017
- Rotating-anode X-ray tube assembly with cooling system5US 9,892,883 B2Toshiba Electron Tubes & Devices Co., Ltd. · 2018
- Capacitively coupled plasma source for abating compounds produced in semiconductor processes4US 9,543,124 B2APPLIED Materials.Inc. · 2017