Electrically conductive ceramic electric field blocking plate

An electric field blocker plate, comprising:

• an electrically conductive ceramic having a bulk resistivity of less than or equal to about 2 ohm/cm formed into a planar surface dimensioned to be disposed over an outlet of a plasma generator, and comprising a plurality of holes disposed therethrough, such that the plurality of holes are located over an outlet of the plasma generator.

A semiconductor processing system, comprising:

• a plasma source;
• and
• a semiconductor processing chamber configured to process a semiconductor substrate, wherein the plasma source is in fluid communication with the semiconductor processing chamber through a plurality of holes disposed through an electric field blocking plate located between an outlet of the plasma source and the semiconductor processing chamber, wherein the electric field blocking plate comprises an electrically conductive ceramic having a bulk resistivity of less than or equal to about 5 ohm/cm.