H01J 27/205
With electrons
Official title: {with electrons, e.g. electron impact ionisation, electron attachment}
H01J27/205 (With electrons) appears on 103 US grants and 107 published applications in this corpus.
Search patents in H01J- Granted patents
- 103
- Published applications
- 107
- Assignees
- 62
- Inventors
- 210
- Latest grant
- 24 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 3 |
| 2005 | 0 | 2 |
| 2006 | 4 | 2 |
| 2007 | 1 | 8 |
| 2008 | 1 | 3 |
| 2009 | 4 | 5 |
| 2010 | 7 | 3 |
| 2011 | 4 | 0 |
| 2012 | 2 | 2 |
| 2013 | 2 | 3 |
| 2014 | 4 | 12 |
| 2015 | 7 | 5 |
| 2016 | 5 | 6 |
| 2017 | 12 | 7 |
| 2018 | 4 | 6 |
| 2019 | 10 | 8 |
| 2020 | 7 | 9 |
| 2021 | 5 | 6 |
| 2022 | 6 | 3 |
| 2023 | 3 | 6 |
| 2024 | 6 | 5 |
| 2025 | 2 | 2 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mass spectrometer24 Mar 2026US 12,586,770 B2Shimadzu Corporation
- Negative ion source and negative ion generation method24 Feb 2026US 12,558,663 B2Japan Atomic Energy Agency
- Ion source assembly with multiple elliptical filaments9 Dec 2025US 12,494,358 B2Inficon GmbH
- Isothermal ion source with auxiliary heaters4 Nov 2025US 12,463,001 B2SHINE Technologies, LLC
- Ionization device and mass spectrometer24 Dec 2024US 12,176,199 B2Leybold Aktiengesellschaft
- Ion source for neutron generator usable in wellbore29 May 2025US 2025/0176091 A1Halliburton Energy Services.Inc.
- Axial ion source with magnetic field adjustment30 Jan 2025US 2025/0037985 A1
- Ion source assembly with multiple elliptical filaments31 Oct 2024US 2024/0363325 A1Inficon GmbH
- An electron impact ionization within radio frequency confinement fields1 Aug 2024US 2024/0258093 A1
- Mass Spectrometer6 Jun 2024US 2024/0186134 A1Shimadzu Corporation
Most cited
By later US patents
- Ion implantation system and control method36US 7,609,003 B2SemEquip, Inc. · 2009
- Ion implantation ion source, system and method30US 7,022,999 B2SemEquip, Inc. · 2006
- Ion implantation ion source, system and method30US 7,107,929 B2SemEquip, Inc. · 2006
- Ion implantation ion source, system and method26US 7,185,602 B2SemEquip, Inc. · 2007
- Ion implantation system and control method24US 7,064,491 B2SemEquip, Inc. · 2006