H01J 27/022
Details
Official title: {Details}
H01J27/022 (Details) appears on 408 US grants and 348 published applications in this corpus.
Search patents in H01J- Granted patents
- 408
- Published applications
- 348
- Assignees
- 208
- Inventors
- 828
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 3 | 0 |
| 1985 | 1 | 0 |
| 1986 | 6 | 0 |
| 1987 | 3 | 0 |
| 1988 | 12 | 0 |
| 1989 | 4 | 0 |
| 1990 | 5 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 5 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 6 | 0 |
| 1997 | 6 | 0 |
| 1998 | 2 | 0 |
| 1999 | 6 | 0 |
| 2000 | 1 | 0 |
| 2001 | 6 | 2 |
| 2002 | 1 | 4 |
| 2003 | 5 | 4 |
| 2004 | 5 | 5 |
| 2005 | 6 | 7 |
| 2006 | 9 | 11 |
| 2007 | 4 | 13 |
| 2008 | 8 | 15 |
| 2009 | 13 | 8 |
| 2010 | 11 | 14 |
| 2011 | 6 | 13 |
| 2012 | 7 | 6 |
| 2013 | 19 | 31 |
| 2014 | 26 | 35 |
| 2015 | 25 | 24 |
| 2016 | 33 | 23 |
| 2017 | 28 | 26 |
| 2018 | 25 | 20 |
| 2019 | 22 | 15 |
| 2020 | 14 | 13 |
| 2021 | 12 | 16 |
| 2022 | 16 | 13 |
| 2023 | 11 | 12 |
| 2024 | 7 | 8 |
| 2025 | 9 | 8 |
| 2026 | 3 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Ion beam extraction apparatus and method for creating an ion beam28 Jul 2026US 12,695,045 B2MAX-PLANCK-GESELLSCHAFT zur FOERDERUNG der WISSENSCHAFTEN.e.V
- Extraction grid24 Feb 2026US 12,562,331 B2BüHler Alzenau GmbH
- Ion source head and ion source head curved liner, deflector, or repeller13 Jan 2026US 12,525,421 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly23 Dec 2025US 12,505,979 B2Canon Anelva Corporation
- Adjustable support for arc chamber of ion source9 Sep 2025US 12,412,725 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Ion source head and ion source head curved liner, deflector, or repeller23 Apr 2026US 2026/0112567 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion source26 Feb 2026US 2026/0058092 A1
- Ion source for controlling decomposition buildup using chlorine co-gas30 Oct 2025US 2025/0336633 A1APPLIED Materials.Inc.
- Adjustable support for arc chamber of ion source16 Oct 2025US 2025/0323004 A1Taiwan Semiconductor Manufacturing Company.Ltd
- High-efficiency target for an ion source12 Jun 2025US 2025/0188592 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Filtered cathodic arc source68US 5,279,723 Aas represented by the United States Department of Energy · 1994
- Apparatus and methods for ion implantation67US 4,847,504 AAPPLIED Materials.Inc. · 1989
- Three-dimensional quadrupole mass spectrometer55US 5,747,800 AHitachi, Ltd. · 1998
- Ion implantation apparatus having increased source lifetime55US 5,886,355 AAPPLIED Materials.Inc. · 1999
- Ion beam source54US 4,467,240 AHitachi, Ltd. · 1984