H01J 2237/20242
Eucentric movement
H01J2237/20242 (Eucentric movement) appears on 16 US grants and 18 published applications in this corpus.
Search patents in H01J- Granted patents
- 16
- Published applications
- 18
- Assignees
- 15
- Inventors
- 65
- Latest grant
- 16 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 1 | 1 |
| 2007 | 0 | 1 |
| 2008 | 0 | 1 |
| 2009 | 1 | 1 |
| 2010 | 1 | 1 |
| 2011 | 1 | 1 |
| 2012 | 0 | 1 |
| 2013 | 1 | 0 |
| 2014 | 2 | 4 |
| 2015 | 1 | 0 |
| 2016 | 1 | 0 |
| 2017 | 0 | 1 |
| 2018 | 0 | 1 |
| 2019 | 2 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 1 |
| 2022 | 1 | 1 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 1 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Diffractometer for charged-particle crystallography16 Sep 2025US 12,417,893 B2Eldico Scientific AG
- Focused ion beam apparatus25 Oct 2022US 11,482,398 B2Hitachi High-Tech Science Corporation
- Specimen preparation and inspection in a dual-beam charged particle microscope21 Apr 2020US 10,629,409 B2FEI Company
- Charged particle beam apparatus5 Nov 2019US 10,468,228 B2Hitachi High-Tech Science Corporation
- Apparatus for measuring semiconductor device7 May 2019US 10,281,412 B2Samsung Electronics Co., Ltd.
- Observation Instrument and Control Method for Sample Stage8 Jan 2026US 2026/0011527 A1JEOL Ltd.
- Assessment apparatus and methods24 Apr 2025US 2025/0132122 A1ASML Netherlands B. V.
- Diffractometer for charged-particle crystallography28 Jul 2022US 2022/0238299 A1Eldico Scientific AG
- Focused ion beam apparatus25 Mar 2021US 2021/0090849 A1Hitachi High-Tech Science Corporation
- Specimen preparation and inspection in a dual-beam charged particle microscope11 Apr 2019US 2019/0108971 A1FEI Company
Most cited
By later US patents
- Ion beam measurement systems and methods for ion implant dose and uniformity control25US 6,992,309 B1Axcelis Technologies, Inc. · 2006
- Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating a sample in such an apparatus15US 7,474,419 B2FEI Company · 2009
- Scanning charged-particle beam instrument10US 6,444,991 B1JEOL Ltd. · 2002
- Composite charged-particle beam system8US 7,718,981 B2SII NanoTechnology Inc. · 2010
- Bi-axial-tilting specimen fine motion device and method of correcting image shifting6US 5,591,980 AHitachi, Ltd. · 1997