H01J 2237/06366
Gas discharge electron sources
H01J2237/06366 (Gas discharge electron sources) appears on 15 US grants and 21 published applications in this corpus.
Search patents in H01J- Granted patents
- 15
- Published applications
- 21
- Assignees
- 18
- Inventors
- 58
- Latest grant
- 30 Apr 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 1 |
| 2009 | 1 | 2 |
| 2010 | 1 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 1 | 2 |
| 2014 | 0 | 0 |
| 2015 | 0 | 2 |
| 2016 | 2 | 2 |
| 2017 | 0 | 2 |
| 2018 | 2 | 1 |
| 2019 | 0 | 0 |
| 2020 | 0 | 1 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 1 |
| 2024 | 2 | 2 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Carbon materials30 Apr 2024US 11,970,400 B2Plasma App Ltd.
- Electron source devices, electron source assemblies, and methods for generating electrons2 Jan 2024US 11,862,426 B1Teledyne FLIR Detection, Inc.
- Virtual cathode deposition (VCD) for thin film manufacturing14 Aug 2018US 10,047,432 B2Plasma App Ltd.
- Apparatus for suppression of arcs in an electron beam generator23 Jan 2018US 9,875,874 B2Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Electron beam generator, image apparatus including the same and optical apparatus4 Oct 2016US 9,460,888 B2Electronics and Telecommunications Research Institute
- Electron beam device for surface treatment16 Oct 2025US 2025/0323006 A1
- Electron beam welding systems employing a plasma cathode9 May 2024US 2024/0153739 A1US Electron, Inc.
- Carbon materials18 Jan 2024US 2024/0018005 A1Plasma App Ltd.
- Electron source, plasma source and switch device23 Nov 2023US 2023/0377828 A1Kabushiki Kaisha Toshiba
- Electron beam welding systems employing a plasma cathode1 Dec 2022US 2022/0384138 A1
Most cited
By later US patents
- Electron beam excited plasma system60US 5,397,956 ATokyo Electron Limited · 1995
- Charged particle beam system having multiple user-selectable operating modes27US 8,253,118 B2FEI Company · 2012
- Slotted antenna waveguide plasma source17US 7,305,935 B1The United States of America as represented by the Administration of NASA · 2007
- Apparatus for performing plasma process on semiconductor wafers and the like and method of performing plasma process12US 5,601,653 AKabushiki Kaisha Toshiba · 1997
- Charged particle beam system having multiple user-selectable operating modes12US 8,445,870 B2FEI Company · 2013