H01F 41/308
Lift-off processes
Official title: {lift-off processes, e.g. ion milling, for trimming or patterning}
H01F41/308 (Lift-off processes) appears on 212 US grants and 230 published applications in this corpus.
Search patents in H01F- Granted patents
- 212
- Published applications
- 230
- Assignees
- 90
- Inventors
- 447
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 7 | 10 |
| 2003 | 8 | 16 |
| 2004 | 12 | 19 |
| 2005 | 14 | 18 |
| 2006 | 13 | 12 |
| 2007 | 11 | 11 |
| 2008 | 8 | 13 |
| 2009 | 7 | 5 |
| 2010 | 7 | 6 |
| 2011 | 6 | 6 |
| 2012 | 10 | 4 |
| 2013 | 6 | 6 |
| 2014 | 8 | 9 |
| 2015 | 3 | 4 |
| 2016 | 5 | 6 |
| 2017 | 7 | 3 |
| 2018 | 0 | 4 |
| 2019 | 12 | 16 |
| 2020 | 13 | 19 |
| 2021 | 17 | 17 |
| 2022 | 5 | 7 |
| 2023 | 11 | 10 |
| 2024 | 9 | 6 |
| 2025 | 6 | 2 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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Most cited
By later US patents
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- Method and system for cleaning magnetic artifacts using a carbonyl reactive ion etch153US 7,819,979 B1Western Digital (Fremont), LLC · 2010
- Method and system for providing a self-aligned electrical contact for a TMR element148US 6,683,763 B1Western Digital (Fremont), LLC · 2004
- Combination etch stop and in situ resistor in a magnetoresistive memory and methods for fabricating same148US 6,785,159 B2Micron Technology, Inc. · 2004