H01C 17/2404
By charged particle impact
Official title: {by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching}
H01C17/2404 (By charged particle impact) appears on 6 US grants and 6 published applications in this corpus.
Search patents in H01C- Granted patents
- 6
- Published applications
- 6
- Assignees
- 7
- Inventors
- 23
- Latest grant
- 9 Jun 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 1 |
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 1 | 1 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- IC with ion milled thin-film resistors9 Jun 2020US 10,680,056 B1Texas Instruments Incorporated
- Method for controlling the sheet resistance of thin film resistors5 Nov 2002US 6,475,400 B2TRW Inc.
- Focused ion beam for thin film resistor trim on aluminum nitride substrates30 Nov 1993US 5,266,529 ATRW Inc.
- Technique for treating manufactured thick film resistors22 Dec 1987US 4,714,911 AADM Tronics Unlimited, Inc.
- System for trimming microelectronic resistors10 Nov 1987US 4,705,931 AADM Tronics Unlimited, Inc.
- Anisotropic conductive adhesive compounds for an rtd27 Nov 2025US 2025/0364163 A1Yageo Nexensos GmbH
- Ic with ion milled thin-film resistors2 Jul 2020US 2020/0212167 A1Texas Instruments Incorporated
- Energy beam processing apparatus and energy beam processing method31 Oct 2013US 2013/0288399 A1Fujitsu Limited
- Method for producing a layer with a predefined layer thickness profile28 Oct 2004US 2004/0212459 A1
- Method for fabricting a resistor on a printed circuit board16 Oct 2003US 2003/0194845 A1Compeq Manufacturing Company Limited
Most cited
By later US patents
- Focused ion beam for thin film resistor trim on aluminum nitride substrates10US 5,266,529 ATRW Inc. · 1993
- Technique for treating manufactured thick film resistors9US 4,714,911 AADM Tronics Unlimited, Inc. · 1987
- Electroresistor and method of making same7US 4,075,452 ASociete Francaise de l'Electro-Resistance · 1978
- System for trimming microelectronic resistors4US 4,705,931 AADM Tronics Unlimited, Inc. · 1987
- Method for controlling the sheet resistance of thin film resistors4US 6,475,400 B2TRW Inc. · 2002