G03F 1/92
Prepared from printing surfaces
Official title: prepared from printing surfaces
G03F1/92 (Prepared from printing surfaces) appears on 10 US grants and 7 published applications in this corpus.
Search patents in G03F- Granted patents
- 10
- Published applications
- 7
- Assignees
- 9
- Inventors
- 26
- Latest grant
- 5 Nov 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 2 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 1 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 2 |
| 2024 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Random weight initialization of non-volatile memory array5 Nov 2024US 12,135,497 B2International Business Machines Corporation
- Technique for defining active regions of semiconductor devices with reduced lithography effort5 Feb 2019US 10,199,259 B1Globalfoundries Inc.
- Method of manufacturing a photomask with flexography29 Dec 2015US 9,223,201 B2Uni-Pixel Displays, Inc.
- Mask for near-field lithography and fabrication the same30 Jun 2015US 9,069,244 B2Rolith, Inc.
- Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method14 Jul 2009US 7,560,197 B2Kabushiki Kaisha Toshiba
- Hologram color designation system and hologram color designation method based on dithering mask14 Dec 2023US 2023/0400810 A1Ulsan National Institute of Science and Technology (UNIST)
- Random weight initialization of non-volatile memory array30 Mar 2023US 2023/0094719 A1International Business Machines Corporation
- Technique for defining active regions of semiconductor devices with reduced lithography effort7 Feb 2019US 2019/0043752 A1Globalfoundries Inc.
- Method of manufacturing a photomask with flexography1 Jan 2015US 2015/0004530 A1Uni-Pixel Displays, Inc.
- Mask for near-field lithography and fabrication the same29 Aug 2013US 2013/0224636 A1Rolith, Inc.
Most cited
By later US patents
- Barrier layer for laser ablative imaging37US 5,468,591 AEastman Kodak Company · 1995
- Vinyl polymer binder for laser ablative imaging27US 5,576,144 AEastman Kodak Company · 1996
- Cinnamal-nitrile dyes for laser recording element22US 5,578,416 AEastman Kodak Company · 1996
- Mask for near-field lithography and fabrication the same22US 9,069,244 B2Rolith, Inc. · 2015
- Cutting device for masking film16US 4,934,054 AKimoto Co., Ltd. · 1990