G02B 5/0891
Ultraviolet [uv] mirrors
Official title: {Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06)}
G02B5/0891 (Ultraviolet [uv] mirrors) appears on 524 US grants and 686 published applications in this corpus.
Search patents in G02B- Granted patents
- 524
- Published applications
- 686
- Assignees
- 166
- Inventors
- 1,106
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 3 | 0 |
| 2000 | 6 | 0 |
| 2001 | 4 | 0 |
| 2002 | 3 | 3 |
| 2003 | 4 | 13 |
| 2004 | 6 | 9 |
| 2005 | 5 | 16 |
| 2006 | 7 | 15 |
| 2007 | 9 | 10 |
| 2008 | 7 | 14 |
| 2009 | 12 | 15 |
| 2010 | 9 | 24 |
| 2011 | 12 | 23 |
| 2012 | 14 | 28 |
| 2013 | 21 | 36 |
| 2014 | 21 | 35 |
| 2015 | 26 | 39 |
| 2016 | 36 | 50 |
| 2017 | 38 | 29 |
| 2018 | 29 | 32 |
| 2019 | 39 | 30 |
| 2020 | 32 | 32 |
| 2021 | 31 | 32 |
| 2022 | 29 | 49 |
| 2023 | 19 | 50 |
| 2024 | 27 | 30 |
| 2025 | 36 | 38 |
| 2026 | 16 | 34 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optical element, optical arrangement and insert component15 Sep 2026US 12,736,773 B2Carl Zeiss SMT GmbH
- Apparatus and method for cleaning an inspection system8 Sep 2026US 12,730,059 B2ASML Netherlands B. V.
- Method and apparatus for deposition of at least one layer, optical element and optical arrangement28 Jul 2026US 12,692,603 B2Carl Zeiss SMT GmbH
- Method for producing a mirror of a microlithographic projection exposure apparatus21 Jul 2026US 12,687,665 B2Carl Zeiss SMT GmbH
- Method for producing a mirror of a lithography system30 Jun 2026US 12,669,675 B2Carl Zeiss SMT GmbH
- Multilayer Articles Including an Absorbent Layer and an Ultraviolet Mirror, Systems, Devices, and Methods of Disinfecting24 Sep 2026US 2026/0284248 A13M Innovative Properties Company
- Euv mirror with improved optical stability10 Sep 2026US 2026/0267232 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Compensation of operationally induced thermal deformations in the manufacturing process of an optical element under thermal control during operation3 Sep 2026US 2026/0259040 A1Carl Zeiss SMT GmbH
- Optical element and euv lithography system3 Sep 2026US 2026/0259504 A1Carl Zeiss SMT GmbH
- Mixed reality optical system using micro phosphor and lens element array in a curved waveguide27 Aug 2026US 2026/0251920 A1Sony Interactive Entertainment Inc.
Most cited
By later US patents
- Monocrystalline optical component with curved surface and multilayer coating271US 7,489,441 B2Carl Zeiss SMT GmbH · 2009
- All-polymeric cold mirror126US 5,552,927 AThe Dow Chemical Company · 1996
- All-polymeric cold mirror121US 5,339,198 AThe Dow Chemical Company · 1994
- Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application88US 6,396,900 B1The Regents of the University of California · 2002
- Multilayer mirror with maximum reflectance59US 4,309,075 AOptical Coating Laboratory, Inc. · 1982