Method for producing a mirror of a lithography system
AssigneeCarl Zeiss SMT GmbH
InventorsChristoph Zaczek, Erik Loopstra, Eric Eva
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AssigneeCarl Zeiss SMT GmbH
InventorsChristoph Zaczek, Erik Loopstra, Eric Eva
Estimating the term…
A method for producing a mirror of a lithography system includes providing first and second mirror parts. Cooling channels having elongate cooling channel openings in the region of a first connecting surface of the first mirror part are formed in the first mirror part, and/or cooling channels having elongate cooling channel openings in the region of a second connecting surface of the second mirror part are formed in the second mirror part. The method also includes bringing together the first and second mirror parts so that initially a partial region of the first connecting surface and a partial region of the second connecting surface come into contact and form a common contact surface. The common contact surface is enlarged by continuing to bring the first and second mirror parts together in a direction along the longitudinal extents of the cooling channel openings.
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Dependencies are inferred from the claim text.