Apparatus and method for cleaning an inspection system
AssigneeASML Netherlands B.V.
InventorsAndrey Nikipelov, Saeedeh Farokhipoor, Maarten Van Kampen
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Abstract
A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+), which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
Claims20
A method for cleaning vacuum ultraviolet (VUV) optics of an inspection system, the method comprising:
- supplying hydrogen gas to an environment of VUV optics in the inspection system, wherein the VUV optics includes one or more VUV mirrors, the one or more VUV mirrors coated with a protective coating comprising a noble metal;
- and
- causing ionization of the hydrogen gas to generate hydrogen ions or radicals, wherein the hydrogen ions or radicals clean the VUV optics.
Dependencies are inferred from the claim text.