G01B 15/08
Measuring arrangements characterised by the use of electromagnetic waves or particle radiation
Official title: for measuring roughness or irregularity of surfaces
G01B15/08 (Measuring arrangements characterised by the use of electromagnetic waves or particle radiation) appears on 54 US grants and 69 published applications in this corpus.
Search patents in G01B- Granted patents
- 54
- Published applications
- 69
- Assignees
- 55
- Inventors
- 189
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 2 | 1 |
| 2004 | 2 | 4 |
| 2005 | 0 | 1 |
| 2006 | 1 | 2 |
| 2007 | 1 | 3 |
| 2008 | 4 | 3 |
| 2009 | 0 | 1 |
| 2010 | 3 | 1 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 0 | 2 |
| 2014 | 2 | 6 |
| 2015 | 0 | 1 |
| 2016 | 2 | 1 |
| 2017 | 3 | 2 |
| 2018 | 3 | 2 |
| 2019 | 3 | 6 |
| 2020 | 5 | 5 |
| 2021 | 4 | 3 |
| 2022 | 2 | 7 |
| 2023 | 2 | 2 |
| 2024 | 5 | 6 |
| 2025 | 4 | 1 |
| 2026 | 2 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of performing metrology on a microfabrication pattern5 May 2026US 12,620,550 B2Imec Vzw
- System and method for sensing topology of a planet6 Jan 2026US 12,516,926 B2Galaxeye Space Solutions Private Limited
- System and method for determining the thickness of a material in manufacturing vessels23 Dec 2025US 12,504,272 B2Paneratech, Inc.
- Axial deviation estimating device28 Oct 2025US 12,455,350 B2Denso Corporation
- Pattern measurement system, pattern measurement method, and program for measuring edge roughness at the edge of a pattern based on a random noise component1 Jul 2025US 12,347,074 B2Hitachi High-Tech Corporation
- Method of and system for processing threedimensional measurement data from a scanning probe microscopy system, as well as computer program product8 Oct 2026US 2026/0309744 A1Nearfield Instruments B.V.
- Apparatus for wavelength-resolved beam monitoring1 Oct 2026US 2026/0299434 A1ASML Netherlands B. V.
- A novel method for joint sensing and communication by exploiting rough and smooth surfaces at millimeter-wave and terahertz frequencies3 Sep 2026US 2026/0261348 A1Istanbul Medipol Universitesi
- Controller, a vehicle and a method9 Jul 2026US 2026/0192625 A1NXP B. V.
- Euv mask inspecting methods and systems28 May 2026US 2026/0147267 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Pattern inspection method45US 7,049,589 B2Hitachi High-Technologies Corporation · 2006
- X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof36US 10,151,713 B2Industrial Technology Research Institute · 2018
- Measurement of thin films and barrier layers on patterned wafers with X-ray reflectometry36US 6,754,305 B1Therma-Wave, Inc. · 2004
- Method of measuring three-dimensional surface roughness of a structure36US 7,348,556 B2FEI Company · 2008
- Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same28US 7,416,604 B2Sumitomo Electric Industries, Ltd. · 2008