F27D 7/02
Supplying steam, vapour, gases or liquids
F27D7/02 (Supplying steam, vapour, gases or liquids) appears on 230 US grants and 241 published applications in this corpus.
Search patents in F27D- Granted patents
- 230
- Published applications
- 241
- Assignees
- 226
- Inventors
- 689
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 5 | 0 |
| 1979 | 3 | 0 |
| 1980 | 3 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 3 | 0 |
| 1984 | 3 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 5 | 0 |
| 1990 | 8 | 0 |
| 1991 | 4 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 1 | 0 |
| 1996 | 5 | 0 |
| 1997 | 5 | 0 |
| 1998 | 1 | 0 |
| 1999 | 5 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 3 |
| 2002 | 4 | 4 |
| 2003 | 6 | 1 |
| 2004 | 3 | 3 |
| 2005 | 2 | 3 |
| 2006 | 1 | 1 |
| 2007 | 0 | 1 |
| 2008 | 1 | 2 |
| 2009 | 2 | 3 |
| 2010 | 2 | 0 |
| 2011 | 0 | 5 |
| 2012 | 0 | 3 |
| 2013 | 2 | 11 |
| 2014 | 3 | 17 |
| 2015 | 5 | 11 |
| 2016 | 13 | 20 |
| 2017 | 14 | 12 |
| 2018 | 6 | 12 |
| 2019 | 16 | 6 |
| 2020 | 5 | 15 |
| 2021 | 5 | 17 |
| 2022 | 12 | 24 |
| 2023 | 13 | 22 |
| 2024 | 15 | 16 |
| 2025 | 15 | 15 |
| 2026 | 14 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Process for processing hard metal15 Sep 2026US 12,735,766 B2Betek GmbH & Co. KG
- Semiconductor high pressure annealing device25 Aug 2026US 12,721,088 B2Tokyo Electron Limited
- High pressure heat treatment apparatus4 Aug 2026US 12,698,939 B2HPSP Co., Ltd.
- Heat treatment device and method of manufacturing display panel using the same28 Jul 2026US 12,693,074 B2Samsung Display Co., Ltd.
- Processing method and processing apparatus for metal component19 May 2026US 12,630,914 B2Parker Netsushori Kogyo K.K.
- Temperature-control device1 Oct 2026US 2026/0297702 A1EBNER Industrieofenbau GmbH
- Heat treatment apparatus and heat treatment method1 Oct 2026US 2026/0298540 A1Tokyo Electron Limited
- Method and system for the production of different products under different reduction conditions in different portions of a shaft furnace27 Aug 2026US 2026/0250790 A1Midrex Technologies, Inc.
- Shuttle kiln with enhanced radiant heat retention9 Jul 2026US 2026/0194297 A1Corning Incorporated
- Furnace atmosphere control device and method2 Jul 2026US 2026/0185775 A1L' Air Liquide, Societe Anonyme pour I' Etude et I'Exploitation des Procedes Georges Claude
Most cited
By later US patents
- Heat treatment apparatus468US 9,759,489 B2Tokyo Electron Limited · 2017
- Forced cooling apparatus for heat treatment apparatus370US 5,249,960 ATokyo Electron Sagami Limited · 1993
- Gas control system for chemical vapor deposition system110US 4,369,031 AThermco Products Corporation · 1983
- Vertical heat-treating apparatus and heat insulator31US 5,480,300 AShin-Etsu Quartz Products Co., Ltd. · 1996
- Dual mode convection oven26US 6,116,895 AMcNeil-PPC, Inc. · 2000