C08F 220/365
Containing further carboxylic moieties
Official title: {containing further carboxylic moieties}
C08F220/365 (Containing further carboxylic moieties) appears on 114 US grants and 151 published applications in this corpus.
Search patents in C08F- Granted patents
- 114
- Published applications
- 151
- Assignees
- 94
- Inventors
- 471
- Latest grant
- 12 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 4 |
| 2008 | 2 | 3 |
| 2009 | 1 | 4 |
| 2010 | 1 | 5 |
| 2011 | 0 | 4 |
| 2012 | 3 | 1 |
| 2013 | 2 | 9 |
| 2014 | 2 | 11 |
| 2015 | 7 | 5 |
| 2016 | 8 | 6 |
| 2017 | 10 | 11 |
| 2018 | 7 | 18 |
| 2019 | 4 | 9 |
| 2020 | 20 | 17 |
| 2021 | 11 | 8 |
| 2022 | 6 | 6 |
| 2023 | 6 | 7 |
| 2024 | 6 | 9 |
| 2025 | 2 | 7 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- EUV resist underlayer film-forming composition12 May 2026US 12,625,431 B2Nissan Chemical Corporation
- Methods and immunogenic compositions relating to HER2 with selective sequence modifications28 Apr 2026US 12,611,463 B2Wayne State University
- Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound24 Feb 2026US 12,560,866 B2Jsr Corporation
- Photoresist resin, method for producing photoresist resin, photoresist resin composition, and method for forming pattern4 Nov 2025US 12,461,443 B2Daicel Corporation
- Temozolomide compounds, polymers prepared therefrom, and method of treating a disease24 Jun 2025US 12,338,244 B2University of Massachusetts
- Euv resist underlayer film-forming composition20 Aug 2026US 2026/0244106 A1Nissan Chemical Corporation
- Materials and methods for light adjustable ophthalmic devices23 Apr 2026US 2026/0109796 A1Johnson & Johnson Surgical Vision, Inc.
- Materials and methods for light adjustable ophthalmic devices23 Apr 2026US 2026/0110920 A1Johnson & Johnson Surgical Vision, Inc.
- Copolymer, photosensitive resin composition, resin cured film, and image display element12 Feb 2026US 2026/0044080 A1Resonac Corporation
- Radiation-sensitive resin composition and method for forming pattern28 Aug 2025US 2025/0271762 A1Jsr Corporation
Most cited
By later US patents
- Linear and cyclic polymers or oligomers having a photoreactive ethene group85US 5,539,074 AHoffmann-La Roche Inc. · 1996
- Photochromic pigment68US 5,821,287 ANational Science Council · 1998
- Method for making contact lenses having UV absorbing properties44US 5,914,355 ABausch & Lomb Incorporated · 1999
- Thermotropic chiral nematic liquid crystalline copolymers39US 5,332,522 AUniversity of Rochester · 1994
- Copolymers based on ethylenically unsaturated monomers and containing urethane groups, processes for their preparation and their use26US 5,102,936 AHoechst Aktiengesellschaft · 1992