C08F 212/32
Containing two or more rings
Official title: containing two or more rings
C08F212/32 (Containing two or more rings) appears on 254 US grants and 328 published applications in this corpus.
Search patents in C08F- Granted patents
- 254
- Published applications
- 328
- Assignees
- 123
- Inventors
- 751
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 3 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 3 | 3 |
| 2003 | 2 | 4 |
| 2004 | 5 | 4 |
| 2005 | 4 | 3 |
| 2006 | 0 | 4 |
| 2007 | 0 | 3 |
| 2008 | 4 | 11 |
| 2009 | 3 | 3 |
| 2010 | 5 | 14 |
| 2011 | 3 | 10 |
| 2012 | 5 | 10 |
| 2013 | 9 | 20 |
| 2014 | 13 | 19 |
| 2015 | 21 | 22 |
| 2016 | 21 | 25 |
| 2017 | 12 | 18 |
| 2018 | 19 | 12 |
| 2019 | 21 | 15 |
| 2020 | 7 | 15 |
| 2021 | 8 | 31 |
| 2022 | 15 | 11 |
| 2023 | 16 | 17 |
| 2024 | 14 | 23 |
| 2025 | 14 | 15 |
| 2026 | 5 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Polyfunctional vinyl aromatic copolymer and method for manufacturing same, copolymer rubber obtained therefrom, rubber composition, rubber crosslinked material, and tire member25 Aug 2026US 12,715,943 B2Nippon Steel Chemical & Material Co., Ltd.
- Photosensitive polymer, photoresist composition including the same, and method of fabricating semiconductor device28 Apr 2026US 12,613,467 B2Samsung Electronics Co., Ltd.
- Hydrophilic polymer, method of preparing the same, and lithium secondary battery containing the hydrophilic polymer31 Mar 2026US 12,590,175 B2Contemporary Amperex Technology (Hong Kong) Limited
- Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof24 Mar 2026US 12,583,961 B2Merck Patent GmbH
- Compositions and polymer films27 Jan 2026US 12,534,583 B2FUJIFILM Corporation
- Resist composition and method for forming resist pattern10 Sep 2026US 2026/0267225 A1Tokyo Ohka Kogyo.Co., Ltd.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process20 Aug 2026US 2026/0242334 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming method30 Jul 2026US 2026/0217887 A1Shin-Etsu Chemical Co., Ltd.
- Monomer, polymer, chemically amplified resist composition, and pattern forming process25 Jun 2026US 2026/0176235 A1Shin-Etsu Chemical Co., Ltd.
- Underlayer film material for self-assembled film25 Jun 2026US 2026/0177922 A1Nissan Chemical Corporation
Most cited
By later US patents
- Nanohybrid polymers for ophthalmic applications50US 7,446,157 B2Key Medical Technologies, Inc. · 2008
- Arylcyclobutane/dienophile copolymer43US 4,730,030 AThe Dow Chemical Company · 1988
- Photoresist composition of 1-(1'-cyanoethenyl)adamantane37US 5,399,647 AFujitsu Limited · 1995
- Nanohybrid polymers for ophthalmic applications37US 7,399,811 B2Key Medical Technologies, Inc. · 2008
- UV-absorbing benzotriazoles having a styrene group36US 5,637,726 AWesley-Jessen Corporation · 1997