C08F 212/20
Fluorine
Official title: {Fluorine}
C08F212/20 (Fluorine) appears on 121 US grants and 143 published applications in this corpus.
Search patents in C08F- Granted patents
- 121
- Published applications
- 143
- Assignees
- 47
- Inventors
- 257
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 3 | 5 |
| 2003 | 3 | 2 |
| 2004 | 2 | 1 |
| 2005 | 1 | 0 |
| 2006 | 1 | 1 |
| 2007 | 1 | 0 |
| 2008 | 0 | 1 |
| 2009 | 1 | 2 |
| 2010 | 0 | 4 |
| 2011 | 1 | 3 |
| 2012 | 0 | 5 |
| 2013 | 4 | 5 |
| 2014 | 5 | 2 |
| 2015 | 6 | 10 |
| 2016 | 7 | 21 |
| 2017 | 3 | 9 |
| 2018 | 13 | 8 |
| 2019 | 14 | 7 |
| 2020 | 3 | 15 |
| 2021 | 5 | 10 |
| 2022 | 8 | 3 |
| 2023 | 10 | 9 |
| 2024 | 7 | 7 |
| 2025 | 4 | 4 |
| 2026 | 4 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Additives for electrolyte and cathode material in Li-ion batteries comprising metal-based cathode material which produces M2+ metal ions11 Aug 2026US 12,706,324 B2Hydro-Quebec
- Photosensitive polymer, photoresist composition including the same, and method of fabricating semiconductor device28 Apr 2026US 12,613,467 B2Samsung Electronics Co., Ltd.
- Glycidyl-containing polymers, polymer compositions comprising them and their use in electrochemical cells3 Feb 2026US 12,540,207 B2Hydro-Quebec
- Polymers and nanoparticles for flooding3 Feb 2026US 12,540,270 B2Saudi Arabian Oil Company
- Polymers and nanoparticles for flooding23 Sep 2025US 12,421,444 B2Saudi Arabian Oil Company
- Monomer, polymer, chemically amplified resist composition, and pattern forming process25 Jun 2026US 2026/0176235 A1Shin-Etsu Chemical Co., Ltd.
- Glycidyl-containing polymers, polymer compositions comprising them and their use in electrochemical cells16 Apr 2026US 2026/0103555 A1Hydro-Quebec
- Improved ionomer blends, high-temperature polymer electrolyte membranes and electrode assemblies26 Feb 2026US 2026/0055265 A1The Penn State Research Foundation
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process12 Feb 2026US 2026/0042875 A1Shin-Etsu Chemical Co., Ltd.
- Onium salt, chemically amplified resist composition, and pattern forming process12 Feb 2026US 2026/0044075 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Trifluorostyrene and substituted trifluorostyrene copolymeric compositions and ion-exchange membranes formed therefrom56US 5,422,411 ABallard Power Systems Inc. · 1995
- Polymer for use as protective layers and other components in electrochemical cells50US 10,020,512 B2BASF SE · 2018
- Films and absorbent articles made from copolymers having a copolymerized crosslinker35US 4,071,650 AThe Dow Chemical Company · 1978
- Substituted .alpha.,.beta.,.beta.-trifluorostyrene-based composite membranes31US 5,834,523 ABallard Power Systems Inc. · 1998
- Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions29US 6,610,456 B2International Business Machines Corporation · 2003