C07F 9/902
Compounds without antimony-carbon linkages
Official title: {Compounds without antimony-carbon linkages}
C07F9/902 (Compounds without antimony-carbon linkages) appears on 65 US grants and 33 published applications in this corpus.
Search patents in C07F- Granted patents
- 65
- Published applications
- 33
- Assignees
- 45
- Inventors
- 134
- Latest grant
- 12 Aug 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 2 | 0 |
| 1981 | 4 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 1 |
| 2008 | 1 | 0 |
| 2009 | 0 | 2 |
| 2010 | 1 | 2 |
| 2011 | 1 | 2 |
| 2012 | 2 | 0 |
| 2013 | 0 | 3 |
| 2014 | 2 | 3 |
| 2015 | 2 | 3 |
| 2016 | 2 | 0 |
| 2017 | 2 | 1 |
| 2018 | 2 | 1 |
| 2019 | 0 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 1 |
| 2022 | 0 | 2 |
| 2023 | 1 | 2 |
| 2024 | 2 | 2 |
| 2025 | 1 | 3 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Iodine-containing metal compound and composition for depositing thin film including the same12 Aug 2025US 12,384,805 B2Dnf Co., Ltd.
- Organometallic photoresists for DUV or EUV lithography5 Nov 2024US 12,135,503 B2International Business Machines Corporation
- Photoresist for semiconductor fabrication23 Jul 2024US 12,044,966 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photoresist for semiconductor fabrication15 Aug 2023US 11,726,405 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof16 Jun 2020US 10,683,266 B2San-Apro Ltd.
- Hybrid dialkylphosphinic acid salt, preparation method therefor and use thereof4 Jun 2026US 2026/0152623 A1Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
- Liquid Electrolyte Composition Comprising a Salt, Electrochemical Cell Comprising the Electrolyte Composition, Salt, and Use of the Salt in the Electrochemical Cell10 Jul 2025US 2025/0226450 A1Bayerische Motoren Werke Aktiengesellschaft
- Inorganic silyl and polysilyl derivatives of group v elements and methods of synthesizing the same and methods of using the same for deposition27 Feb 2025US 2025/0066906 A1L' Air Liquide, Societe Anonyme pour I' Etude et I'Exploitation des Procedes Georges Claude
- New inorganic silyl and polysilyl derivatives of group v elements and methods of synthesizing the same and methods of using the same for deposition13 Feb 2025US 2025/0051373 A1L' Air Liquide, Societe Anonyme pour I' Etude et I'Exploitation des Procedes Georges Claude
- Photoresist for semiconductor fabrication21 Nov 2024US 2024/0385516 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Photocurable epoxy compositions containing group Va onium salts166US 4,069,055 AGeneral Electric Company · 1978
- Complex salt photoinitiator90US 4,173,476 AMinnesota Mining and Manufacturing Company · 1979
- Photoinitiators78US 4,161,478 AGeneral Electric Company · 1979
- P, As, and Sb hexafluoride onium salts as photoinitiators67US 4,250,311 AGeneral Electric Company · 1981
- Method for making certain halonium salt photoinitiators57US 3,981,897 AGeneral Electric Company · 1976