C07C 309/58
Carboxylic acid groups or esters thereof
C07C309/58 (Carboxylic acid groups or esters thereof) appears on 59 US grants and 56 published applications in this corpus.
Search patents in C07C- Granted patents
- 59
- Published applications
- 56
- Assignees
- 42
- Inventors
- 165
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 1 | 4 |
| 2005 | 3 | 4 |
| 2006 | 4 | 1 |
| 2007 | 0 | 3 |
| 2008 | 0 | 1 |
| 2009 | 2 | 0 |
| 2010 | 1 | 1 |
| 2011 | 0 | 1 |
| 2012 | 0 | 2 |
| 2013 | 1 | 3 |
| 2014 | 4 | 2 |
| 2015 | 3 | 1 |
| 2016 | 2 | 5 |
| 2017 | 2 | 6 |
| 2018 | 4 | 2 |
| 2019 | 3 | 2 |
| 2020 | 2 | 2 |
| 2021 | 2 | 1 |
| 2022 | 0 | 2 |
| 2023 | 1 | 0 |
| 2024 | 0 | 3 |
| 2025 | 2 | 3 |
| 2026 | 1 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device5 May 2026US 12,619,147 B2FUJIFILM Corporation
- Method for functionalization of an aromatic amino acid or a nucleobase6 May 2025US 12,291,550 B2CF Plus Chemicals s.r.o.
- Sulfoperoxycarboxylic acids, their preparation and methods of use as bleaching and antimicrobial agents21 Jan 2025US 12,203,056 B2Ecolab USA Inc.
- Sulfoperoxycarboxylic acids, their preparation and methods of use as bleaching and antimicrobial agents28 Nov 2023US 11,827,867 B2Ecolab USA Inc.
- Resist composition and patterning process23 Nov 2021US 11,181,823 B2Shin-Etsu Chemical Co., Ltd.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Additive for organic conductors17 Sep 2026US 2026/0274791 A1Panasonic Intellectual Property Management Co., Ltd.
- Resist composition and method for producing resist pattern, and salt and resin23 Jul 2026US 2026/0211321 A1Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device16 Jul 2026US 2026/0202746 A1FUJIFILM Corporation
- Resist composition, resist pattern formation method, compound, and acid generator9 Jul 2026US 2026/0194811 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Ink compositions58US 5,509,957 ACiba-Geigy Corporation · 1996
- Sulfoperoxycarboxylic acids, their preparation and methods of use as bleaching and antimicrobial agents32US 9,676,711 B2Ecolab USA Inc. · 2017
- 4,4-diarylbutadienes as water-soluble photostable UV filters for cosmetic and pharmaceutical preparations31US 6,093,385 ABASF SE · 2000
- 4,4-diarylbutadienes as water-soluble photostable UV filters for cosmetic and pharmaceutical preparation18US 6,191,301 B1BASF SE · 2001
- Macrocyclic anti-viral compound and method16US 5,196,452 AGenelabs Incorporated · 1993