C07C 309/10
With the oxygen atom of at least one of the etherified hydroxy
Official title: with the oxygen atom of at least one of the etherified hydroxy groups further bound to an acyclic carbon atom
C07C309/10 (With the oxygen atom of at least one of the etherified hydroxy) appears on 117 US grants and 122 published applications in this corpus.
Search patents in C07C- Granted patents
- 117
- Published applications
- 122
- Assignees
- 82
- Inventors
- 387
- Latest grant
- 10 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 2 |
| 2003 | 0 | 3 |
| 2004 | 2 | 2 |
| 2005 | 2 | 5 |
| 2006 | 2 | 2 |
| 2007 | 0 | 4 |
| 2008 | 2 | 9 |
| 2009 | 6 | 8 |
| 2010 | 8 | 9 |
| 2011 | 6 | 8 |
| 2012 | 5 | 6 |
| 2013 | 10 | 11 |
| 2014 | 5 | 6 |
| 2015 | 9 | 9 |
| 2016 | 5 | 1 |
| 2017 | 7 | 6 |
| 2018 | 1 | 4 |
| 2019 | 5 | 5 |
| 2020 | 6 | 4 |
| 2021 | 2 | 2 |
| 2022 | 4 | 6 |
| 2023 | 3 | 4 |
| 2024 | 5 | 3 |
| 2025 | 2 | 2 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Salt, acid generator, resist composition and method for producing resist pattern10 Feb 2026US 12,547,073 B2Sumitomo Chemical Company, Limited
- Fuel cell with polymer electrolyte membrane9 Sep 2025US 12,412,916 B2Hyundai Motor Company
- GPR40 agonists1 Apr 2025US 12,264,171 B2Kallyope, Inc.
- Cleavable surfactants13 Aug 2024US 12,060,538 B2Promega Corporation
- Anionic-cationic-nonionic surfactant, production and use thereof16 Jul 2024US 12,037,541 B2China Petroleum & Chemical Corporation
- Gpr40 agonists4 Sep 2025US 2025/0276989 A1Kallyope, Inc.
- Radiation-sensitive resin composition and method for forming pattern28 Aug 2025US 2025/0271761 A1Jsr Corporation
- Oxathianium ion-containing sulfonic acid derivative compound as photoacid generators in resist applications11 Jul 2024US 2024/0231227 A1Heraeus Epurio GmbH
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound13 Jun 2024US 2024/0192592 A1FUJIFILM Corporation
- Radiation-sensitive resin composition and pattern formation method9 May 2024US 2024/0152048 A1Jsr Corporation
Most cited
By later US patents
- Resist composition, method of forming resist pattern, novel compound, and acid generator57US 7,713,679 B2Tokyo Ohka Kogyo Co., Ltd. · 2010
- Prostaglandin receptor ligands35US 6,211,197 B1Merck Frosst Canada, Inc. · 2001
- Ether compounds and compositions for cholesterol management and related uses35US 6,713,507 B2Esperion Therapeutics, Inc. · 2004
- Photoacid generators for use in photoresist compositions35US 6,855,476 B2Arch Specialty Chemicals, Inc. · 2005
- Fatty acid esters of polyalkoxylated isethionic acid32US 5,393,466 ALever Brothers Company, Division of Conopco, Inc. · 1995