Photoacid generators for use in photoresist compositions

A photoresist composition comprising:

• a polymer;
• and
• a photoacid compound having the following general structure:
• R—O(CF2)nSO3X
• wherein n is an integer between about 1 to 4;
• R is selected from the group consisting of:
• substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q— wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, and glycidyl;
• and X is covalently bonded organic radicals selected from the group consisting of:
• sulfonic esters of polyhydroxyphenols and alpha sulfonyloxyketones.

A photoresist composition comprising:

• a polymer that is a silicon-containing polymer having alkali solubilizing groups protected by an acid sensitive group;
• and
• a photoacid compound having the following general structure:
• R—O(CF2)nSO3X
• wherein n is an integer between about 1 to 4;
• R is selected from the group consisting of:
• substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q — wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, and glycidyl;
• and X is selected from the group consisting of:
• organic iodonium cations, organic sulfonium cations except trimethyl sulfonium cations, and covalently bonded organic radicals selected from the group consisting of:
• oxime sulfonates, N-hydroxyimide sulfonates, substituted or unsubstituted nitrobenzyl esters, sulfonic esters of polyhydroxyphenols and alpha sulfonyloxyketones.