Resist composition, method of forming resist pattern, novel compound, and acid generator

A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein

• the acid generator component (B) comprises an acid generator (B1) represented by a general formula (B1-1) shown below:
• (wherein, RX represents a hydrocarbon group which may contain a substituent group;
• Q1 represents an alkylene group of 1 to 12 carbon atoms which may contain a substituent group, or a single bond;
• n represents an integer of 0 or 1;
• Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms;
• and A+ represents an organic cation which contains a nitrogen atom), and
• said A+ in the general formula (B1-1) comprises a group represented by a general formula (I) shown below:
• (in the formula, W1 represents an oxygen atom or a sulfur atom;
• Q2 represents an alkylene group or a single bond;
• and R7 and R8 each independently represents a hydrogen atom, an alkyl group which may contain a substituent group, an aliphatic cyclic group which may contain a substituent group, or an aromatic cyclic group which may contain a substituent group, wherein R7 and R8 may mutually be bonded to form a ring).