Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound

A compound represented by any of the following general formulas (IA)-1 to (IA)-3:

• wherein, in the general formulas (IA)-1 to (IA)-3,
• A11− and A13− to A16− each independently represent an acid anionic group represented by the formula (A-1) or (A-2) below;
• A12 represents an acid anionic group represented by any of the following formulas (B-1) to (B-3);
• C11+ to C16+ each independently represent a cationic group;
• L11 to L14 each independently represent a divalent organic group;
• and
• L15 represents a trivalent organic group;
• wherein, in the formulas (A-1) to (A-2),
• RA represents an organic group;
• and
• * represents a bonding position;
• and
• wherein, in the formulas (B-1) to (B-3),
• * represents a bonding position.