C07C 309/06
Containing halogen atoms, or nitro or nitroso groups bound to the carbon
Official title: containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
C07C309/06 (Containing halogen atoms, or nitro or nitroso groups bound to the carbon) appears on 189 US grants and 233 published applications in this corpus.
Search patents in C07C- Granted patents
- 189
- Published applications
- 233
- Assignees
- 96
- Inventors
- 457
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 1 |
| 2004 | 1 | 1 |
| 2005 | 0 | 3 |
| 2006 | 1 | 2 |
| 2007 | 1 | 5 |
| 2008 | 3 | 5 |
| 2009 | 3 | 11 |
| 2010 | 8 | 5 |
| 2011 | 7 | 14 |
| 2012 | 3 | 14 |
| 2013 | 2 | 13 |
| 2014 | 16 | 8 |
| 2015 | 25 | 10 |
| 2016 | 6 | 21 |
| 2017 | 18 | 17 |
| 2018 | 17 | 23 |
| 2019 | 11 | 11 |
| 2020 | 8 | 10 |
| 2021 | 7 | 15 |
| 2022 | 8 | 8 |
| 2023 | 13 | 16 |
| 2024 | 12 | 9 |
| 2025 | 5 | 6 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Non-aqueous electrolytic solution for lithium secondary battery and lithium secondary battery comprising same5 May 2026US 12,620,624 B2LG Energy Solution, Ltd.
- Resist topcoat composition, and method of forming patterns using the composition31 Mar 2026US 12,590,221 B2Samsung Electronics Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound17 Feb 2026US 12,554,196 B2FUJIFILM Corporation
- Sulfonium salt, photoacid generator, curable composition, and resist composition4 Nov 2025US 12,461,444 B2San-Apro Ltd.
- Pharmaceutically acceptable acid salt of free base of GLP1 receptor agonist, and preparation method therefor23 Sep 2025US 12,421,245 B2Hangzhou Zhongmei Huadong Pharmaceutical Co., Ltd.
- Onium salt, chemically amplified resist composition, and pattern forming process6 Aug 2026US 2026/0226003 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt, chemically amplified resist composition, and pattern forming process30 Jul 2026US 2026/0219571 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt, chemically amplified resist composition and pattern forming process11 Jun 2026US 2026/0161074 A1Shin-Etsu Chemical Co., Ltd.
- Pharmaceutically acceptable acid salt of free base of glp1 receptor agonist, and preparation method therefor9 Apr 2026US 2026/0098042 A1Hangzhou Zhongmei Huadong Pharmaceutical Co., Ltd.
- Radiation-sensitive resin composition and method for forming resist pattern11 Dec 2025US 2025/0377590 A1Jsr Corporation
Most cited
By later US patents
- Radiation-sensitive composition of chemical amplification type64US 6,358,665 B1Clariant International Ltd. · 2002
- Alkoxy compounds for disease treatment48US 7,982,071 B2Acucela Inc. · 2011
- Monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof28US 7,534,844 B2Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) · 2009
- Photoacid generator compounds and compositions25US 7,824,839 B2Cornell Research Foundation, Inc. · 2010
- Spirocyclic cyclohexane compounds24US 7,547,707 B2Gruenenthal GmbH · 2009