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US 7,534,844 B2Granted
Monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof
AssigneeIucf-Hyu (Industry-University Cooperation Foundation Hanyang University)
InventorsHaiwon Lee, Heeyoung Oh, Hyunjin Yoon, Yongil Kim
Life of this patent
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Abstract
The present invention relates to a novel compound with a fluoroalkylsulfonium photoacid generating group and novel copolymers having superior solubility in organic solvents, which is prepared from radical polymerization of the novel compound with methacrylate monomers.
Claims6
A compound substitute with fluoroalkylsulfonium, which is represented by the following formula 1:
- wherein
- R1 and R2 are independently an unsubstituted phenyl or a phenyl substituted with an electron donating group or an electron withdrawing group selected from the group consisting of C1-C6 alkylcarbonyl, aldehyde, cyano, nitro and phenyl;
- R3 is a hydrogen atom or a linear, branched or cyclic C1-C6 alkyl group, and
- n is an integer of from 0 to 20.
1 more element
A copolymer in which a fluoroalkylsulfonium substituted photoacid generating group is introduced at the side chain, which is represented by the following formula 2:
- wherein
- R1 and R2 are independently an unsubstituted phenyl or a phenyl substituted with an electron donating group or an electron withdrawing group selected from the group consisting of C1-C6 alkylcarbonyl, aldehyde, cyano, nitro and phenyl;
- R4 is a linear, branched or cyclic C1-C20 alkyl group;
- R5 and R6 are independently a hydrogen atom or a linear, branched or cyclic C1-C6 alkyl group;
- n is an integer of from 0 to 20;
- and
- x+y=1, where 0≦x≦0.99 and 0.01≦y≦1.
4 more elements
Dependencies are inferred from the claim text.