Resist topcoat composition, and method of forming patterns using the composition

A resist topcoat composition, the composition comprising:

• an acrylic copolymer comprising a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula 2-1 or Chemical Formula 2-2;
• an acid compound;
• and
• a solvent:
• wherein, in Chemical Formula M-1,
• R1 is hydrogen or a substituted or unsubstituted C1 to C10 alkyl group,
• R2 is hydrogen, a fluorine, a hydroxy group, or a substituted or unsubstituted C1 to C20 alkyl group,
• L1 and L2 are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group,
• X1 is a single bond, —O—, —S—, —S(O)—, —S(O)2—, —C(O)—, —(CO)O—, —O(CO), —O(CO)O—, or —NR′—, wherein R′ is hydrogen, deuterium, or a C1 to C10 alkyl group,
• R2, L1, and L2 together comprise a fluorine and a hydroxy group, and
• * is a linking point;
• and
• wherein in Chemical Formula 2-1 and Chemical Formula 2-2,
• R3 is hydrogen or a substituted or unsubstituted C1 to C10 alkyl group,
• Re, Rf, Rg, Rh, R4, and R5 are each independently hydrogen, a hydroxy group, or a substituted or unsubstituted C1 to C10 alkyl group,
• n1 is an integer of 5 to 10,
• n2 and n3 are each independently an integer of 1 to 10, and
• * is a linking point.