C07C 2603/88
Ethanoanthracenes
Official title: Ethanoanthracenes; Hydrogenated ethanoanthracenes
C07C2603/88 (Ethanoanthracenes) appears on 15 US grants and 20 published applications in this corpus.
Search patents in C07C- Granted patents
- 15
- Published applications
- 20
- Assignees
- 16
- Inventors
- 84
- Latest grant
- 17 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 1 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 2 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 0 |
| 2016 | 1 | 0 |
| 2017 | 0 | 1 |
| 2018 | 1 | 1 |
| 2019 | 0 | 1 |
| 2020 | 1 | 1 |
| 2021 | 0 | 2 |
| 2022 | 1 | 0 |
| 2023 | 1 | 2 |
| 2024 | 1 | 2 |
| 2025 | 1 | 4 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound17 Feb 2026US 12,554,196 B2FUJIFILM Corporation
- Processes and systems for producing desulfurized alpha olefins5 Aug 2025US 12,378,483 B2Saudi Arabian Oil Company
- Process for stereospecific synthesis of vitamin K2 and its novel intermediates27 Feb 2024US 11,912,654 B2Synergia Life Sciences Pvt. Ltd.
- Radiation-sensitive resin composition and resist pattern-forming method21 Mar 2023US 11,609,495 B2Jsr Corporation
- Resist composition, method of forming resist pattern, compound, and acid generator11 Jan 2022US 11,221,557 B2Tokyo Ohka Kogyo.Co., Ltd.
- Sulfonium salt, chemically amplified resist composition, and pattern forming process30 Jul 2026US 2026/0219569 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition, resist pattern formation method, compound, and acid diffusion control agent16 Jul 2026US 2026/0202743 A1Tokyo Ohka Kogyo.Co., Ltd.
- Onium salt, chemically amplified resist composition, and patterning process4 Sep 2025US 2025/0276954 A1Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive composition, method for forming resist pattern, polymer, and compound14 Aug 2025US 2025/0258431 A1Jsr Corporation
- Onium salt, chemically amplified resist composition, and pattern forming process13 Feb 2025US 2025/0053087 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions62US 4,268,667 AE. I. Du Pont de Nemours and Company · 1981
- Aryloxypropanolaminotetralins, a process for their preparation and pharmaceutical compositions containing them34US 5,254,595 AElf Sanofi · 1993
- Pharmaceutical for treatment of neurological and neuropsychiatric disorders20US 6,191,165 B1Allelix Neuroscience Inc. · 2001
- Bicyclo 2,2,2!octane derivatives15US 5,514,683 AJames Black Foundation Limited · 1996
- Resist composition, method of forming resist pattern, compound, and acid generator6US 10,649,330 B2Tokyo Ohka Kogyo.Co., Ltd. · 2020