Resist composition, method of forming resist pattern, compound, and acid generator

A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition comprising:

• a compound having an anion moiety and a cation moiety (BD1-2) and which is represented by the following general formula (bd1-2);
• and
• a base component (A) that exhibits a changed solubility in a developing solution under the action of acid:
• wherein R001 to R003 each independently represent a monovalent organic group;
• provided that at least one of R001 to R003 represents an organic group having an acid dissociable group which has a cyclic structure;
• and two or more of R001 to R003 may be mutually bonded to form a ring with the sulfur atom;
• Rx1 to Rx4 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure;
• Ry1 and Ry2 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or Ry1 and Ry2 may be mutually bonded to form a ring structure;
• represents a double bond or a single bond;
• Rz1 to Rz4 each independently represent, where valence allows, a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rb2 and Rb3 may be mutually bonded to form a ring structure;
• provided that at least one of Rz1 to Rz4 has an anion group, and the anion moiety as a whole forms an anion having a valency of n;
• and n represents an integer of 1 or more.

A compound having an anion moiety and a cation moiety and which is represented by the following general formula (bd1-2):

• wherein R001 to R003 each independently represent a monovalent organic group;
• provided that at least one of R001 to R003 represents an organic group having an acid dissociable group which has a cyclic structure;
• and two or more of R001 to R003 may be mutually bonded to form a ring with the sulfur atom;
• Rx1 to Rx4 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure;
• Ry1 and Ry2 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or Ry1 and Ry2 may be mutually bonded to form a ring structure;
• represents a double bond or a single bond;
• Rz1 to Rz4 each independently represent, where valence allows, a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure;
• provided that at least one of Rz1 to Rz4 has an anion group, and the anion moiety as a whole forms an anion having a valency of n;
• and n represents an integer of 1 or more.

A resist composition which generates an acid upon exposure and exhibits a changed solubility in a developing solution under the action of acid, the resist composition comprising:

• a base component (A) that exhibits a changed solubility in a developing solution under the action of acid;
• and
• a compound having an anion moiety and a cation moiety (BD1-3) and which is represented by the following general formula (bd1-3):
• wherein Rx1 to Rx4 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure;
• Ry1 and Ry2 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or Ry1 and Ry2 may be mutually bonded to form a ring structure;
• represents a double bond or a single bond;
• Rz1 to Rz4 each independently represent, where valence allows, a hydrogen atom or a hydrocarbon group which may have a substituent, provided that two or more of Rz1 to Rz4 are mutually bonded to form a ring structure;
• provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anion group, and the anion moiety as a whole forms an anion having a valency of n;
• n represents an integer of 1 or more;
• m represents an integer of 1 or more;
• and M3m+ represents an m-valent organic cation having an electron-withdrawing group.

A compound having an anion moiety and a cation moiety and which is represented by the following general formula (bd1-3):

• wherein Rx1 to Rx4 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure;
• Ry1 and Ry2 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, or Ry1 and Ry2 may be mutually bonded to form a ring structure;
• represents a double bond or a single bond;
• Rz1 to Rz4 each independently represent, where valence allows, a hydrogen atom or a hydrocarbon group which may have a substituent, provided that two or more of Rz1 to Rz4 are mutually bonded to form a ring structure;
• provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anion group, and the anion moiety as a whole forms an anion having a valency of n;
• n represents an integer of 1 or more;
• m represents an integer of 1 or more;
• and M3m+ represents an m-valent organic cation having an electron-withdrawing group.