B41J 2/1629
Wet etching
Official title: {wet etching}
B41J2/1629 (Wet etching) appears on 2,452 US grants and 2,247 published applications in this corpus.
Search patents in B41J- Granted patents
- 2,452
- Published applications
- 2,247
- Assignees
- 180
- Inventors
- 1,782
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 5 | 0 |
| 1988 | 7 | 0 |
| 1989 | 12 | 0 |
| 1990 | 12 | 0 |
| 1991 | 8 | 0 |
| 1992 | 13 | 0 |
| 1993 | 9 | 0 |
| 1994 | 7 | 0 |
| 1995 | 10 | 0 |
| 1996 | 14 | 0 |
| 1997 | 16 | 0 |
| 1998 | 34 | 0 |
| 1999 | 33 | 0 |
| 2000 | 51 | 0 |
| 2001 | 142 | 41 |
| 2002 | 133 | 112 |
| 2003 | 91 | 117 |
| 2004 | 109 | 173 |
| 2005 | 131 | 220 |
| 2006 | 134 | 161 |
| 2007 | 123 | 138 |
| 2008 | 126 | 178 |
| 2009 | 143 | 172 |
| 2010 | 134 | 131 |
| 2011 | 164 | 96 |
| 2012 | 95 | 74 |
| 2013 | 89 | 102 |
| 2014 | 91 | 67 |
| 2015 | 97 | 54 |
| 2016 | 61 | 52 |
| 2017 | 48 | 54 |
| 2018 | 48 | 72 |
| 2019 | 65 | 51 |
| 2020 | 46 | 31 |
| 2021 | 38 | 22 |
| 2022 | 26 | 27 |
| 2023 | 18 | 30 |
| 2024 | 18 | 26 |
| 2025 | 20 | 21 |
| 2026 | 15 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Liquid discharge head and liquid discharge apparatus25 Aug 2026US 12,715,214 B2Ricoh Company, Ltd.
- Method for manufacturing liquid ejection head and liquid ejection head25 Aug 2026US 12,715,216 B2Canon Kabushiki Kaisha
- Substrate for liquid ejection head, liquid ejection head, and method for manufacturing substrate for liquid ejection head18 Aug 2026US 12,709,096 B2Canon Kabushiki Kaisha
- Single crystal silicon substrate, liquid discharge head, and method for manufacturing single crystal silicon substrate16 Jun 2026US 12,654,445 B2Seiko Epson Corporation
- Liquid discharge head, element substrate and method for manufacturing the same5 May 2026US 12,617,203 B2Canon Kabushiki Kaisha
- Method of manufacturing liquid discharge head, and liquid discharge head27 Aug 2026US 2026/0249613 A1Canon Kabushiki Kaisha
- Manufacturing method for semiconductor substrate, manufacturing method for liquid ejection head, semiconductor substrate, and liquid ejection head13 Aug 2026US 2026/0233519 A1Canon Kabushiki Kaisha
- Method of manufacturing nozzle plate and nozzle plate13 Aug 2026US 2026/0233525 A1Seiko Epson Corporation
- Piezoelectric element, liquid ejecting head, and liquid ejecting apparatus13 Aug 2026US 2026/0239883 A1Seiko Epson Corporation
- Liquid discharge head substrate and liquid discharge head6 Aug 2026US 2026/0225365 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Ink jet head and a method of manufacturing thereof420US 5,666,141 ASharp Kabushiki Kaisha · 1997
- Polymer-based micromachining for microfluidic devices351US 6,136,212 AThe Regents of the University of Michigan · 2000
- Ink jet print device and print head or print apparatus using the same348US 6,019,457 ACanon Information Systems Research Australia Pty. Ltd. · 2000
- Method of fabricating bubblejet print devices using semiconductor fabrication techniques311US 5,841,452 ACanon Information Systems Research Australia Pty. Ltd. · 1998
- Document having an encoded data structure288US 7,234,645 B2Silverbrook Research Pty Ltd · 2007