B41J 2/1626
Etching
Official title: {etching}
B41J2/1626 (Etching) appears on 4,814 US grants and 4,480 published applications in this corpus.
Search patents in B41J- Granted patents
- 4,814
- Published applications
- 4,480
- Assignees
- 258
- Inventors
- 2,930
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 3 | 0 |
| 1983 | 6 | 0 |
| 1984 | 9 | 0 |
| 1985 | 5 | 0 |
| 1986 | 8 | 0 |
| 1987 | 10 | 0 |
| 1988 | 14 | 0 |
| 1989 | 19 | 0 |
| 1990 | 19 | 0 |
| 1991 | 14 | 0 |
| 1992 | 23 | 0 |
| 1993 | 19 | 0 |
| 1994 | 20 | 0 |
| 1995 | 31 | 0 |
| 1996 | 32 | 0 |
| 1997 | 56 | 0 |
| 1998 | 72 | 0 |
| 1999 | 74 | 0 |
| 2000 | 97 | 0 |
| 2001 | 196 | 67 |
| 2002 | 225 | 202 |
| 2003 | 189 | 190 |
| 2004 | 168 | 319 |
| 2005 | 215 | 440 |
| 2006 | 264 | 357 |
| 2007 | 246 | 288 |
| 2008 | 287 | 396 |
| 2009 | 295 | 401 |
| 2010 | 347 | 287 |
| 2011 | 363 | 176 |
| 2012 | 205 | 134 |
| 2013 | 172 | 158 |
| 2014 | 149 | 103 |
| 2015 | 155 | 93 |
| 2016 | 99 | 117 |
| 2017 | 100 | 107 |
| 2018 | 94 | 128 |
| 2019 | 118 | 90 |
| 2020 | 86 | 81 |
| 2021 | 79 | 53 |
| 2022 | 54 | 67 |
| 2023 | 48 | 69 |
| 2024 | 50 | 51 |
| 2025 | 40 | 55 |
| 2026 | 29 | 51 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Manufacturing method of piezoelectric element, piezoelectric element, and liquid droplet dispensing head22 Sep 2026US 12,745,565 B2Seiko Epson Corporation
- Liquid discharge head and liquid discharge apparatus25 Aug 2026US 12,715,214 B2Ricoh Company, Ltd.
- Method for manufacturing liquid ejection head and liquid ejection head25 Aug 2026US 12,715,216 B2Canon Kabushiki Kaisha
- Substrate for liquid ejection head, liquid ejection head, and method for manufacturing substrate for liquid ejection head18 Aug 2026US 12,709,096 B2Canon Kabushiki Kaisha
- Single crystal silicon substrate, liquid discharge head, and method for manufacturing single crystal silicon substrate16 Jun 2026US 12,654,445 B2Seiko Epson Corporation
- Liquid ejection head substrate and method for manufacturing liquid ejection head substrate10 Sep 2026US 2026/0264403 A1Canon Kabushiki Kaisha
- Manufacturing method of liquid discharge head and liquid discharge head10 Sep 2026US 2026/0264405 A1Seiko Epson Corporation
- Inkjet printing head, inkjet printing device including the inkjet printing head, and method for manufacturing inkjet printing head27 Aug 2026US 2026/0249612 A1Samsung Display Co., Ltd.
- Method of manufacturing liquid discharge head, and liquid discharge head27 Aug 2026US 2026/0249613 A1Canon Kabushiki Kaisha
- Manufacturing method for semiconductor substrate, manufacturing method for liquid ejection head, semiconductor substrate, and liquid ejection head13 Aug 2026US 2026/0233519 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Liquid jet recording head1,616US 4,558,333 ACanon Kabushiki Kaisha · 1985
- Ink jet head and a method of manufacturing thereof420US 5,666,141 ASharp Kabushiki Kaisha · 1997
- Ink-jet recording head with piezoelectric device and method for manufacturing the same368US 6,142,615 ASeiko Epson Corporation · 2000
- Polymer-based micromachining for microfluidic devices351US 6,136,212 AThe Regents of the University of Michigan · 2000
- Ink jet print device and print head or print apparatus using the same348US 6,019,457 ACanon Information Systems Research Australia Pty. Ltd. · 2000