B41J 2/1628
Dry etching
Official title: {dry etching}
B41J2/1628 (Dry etching) appears on 3,250 US grants and 3,184 published applications in this corpus.
Search patents in B41J- Granted patents
- 3,250
- Published applications
- 3,184
- Assignees
- 179
- Inventors
- 1,890
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 3 | 0 |
| 1988 | 4 | 0 |
| 1989 | 6 | 0 |
| 1990 | 12 | 0 |
| 1991 | 7 | 0 |
| 1992 | 15 | 0 |
| 1993 | 8 | 0 |
| 1994 | 7 | 0 |
| 1995 | 13 | 0 |
| 1996 | 9 | 0 |
| 1997 | 22 | 0 |
| 1998 | 27 | 0 |
| 1999 | 31 | 0 |
| 2000 | 42 | 0 |
| 2001 | 132 | 47 |
| 2002 | 151 | 128 |
| 2003 | 118 | 118 |
| 2004 | 114 | 250 |
| 2005 | 161 | 363 |
| 2006 | 221 | 258 |
| 2007 | 209 | 222 |
| 2008 | 229 | 298 |
| 2009 | 220 | 282 |
| 2010 | 266 | 218 |
| 2011 | 276 | 120 |
| 2012 | 119 | 100 |
| 2013 | 120 | 104 |
| 2014 | 93 | 67 |
| 2015 | 105 | 60 |
| 2016 | 69 | 81 |
| 2017 | 60 | 73 |
| 2018 | 63 | 84 |
| 2019 | 76 | 57 |
| 2020 | 60 | 50 |
| 2021 | 52 | 30 |
| 2022 | 32 | 31 |
| 2023 | 23 | 40 |
| 2024 | 25 | 35 |
| 2025 | 25 | 38 |
| 2026 | 15 | 30 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Liquid discharge head and liquid discharge apparatus25 Aug 2026US 12,715,214 B2Ricoh Company, Ltd.
- Method for manufacturing liquid ejection head and liquid ejection head25 Aug 2026US 12,715,216 B2Canon Kabushiki Kaisha
- Substrate for liquid ejection head, liquid ejection head, and method for manufacturing substrate for liquid ejection head18 Aug 2026US 12,709,096 B2Canon Kabushiki Kaisha
- Single crystal silicon substrate, liquid discharge head, and method for manufacturing single crystal silicon substrate16 Jun 2026US 12,654,445 B2Seiko Epson Corporation
- Liquid discharge head, element substrate and method for manufacturing the same5 May 2026US 12,617,203 B2Canon Kabushiki Kaisha
- Liquid ejection head substrate and method for manufacturing liquid ejection head substrate10 Sep 2026US 2026/0264403 A1Canon Kabushiki Kaisha
- Manufacturing method of liquid discharge head and liquid discharge head10 Sep 2026US 2026/0264405 A1Seiko Epson Corporation
- Inkjet printing head, inkjet printing device including the inkjet printing head, and method for manufacturing inkjet printing head27 Aug 2026US 2026/0249612 A1Samsung Display Co., Ltd.
- Manufacturing method for semiconductor substrate, manufacturing method for liquid ejection head, semiconductor substrate, and liquid ejection head13 Aug 2026US 2026/0233519 A1Canon Kabushiki Kaisha
- Method of manufacturing nozzle plate and nozzle plate13 Aug 2026US 2026/0233525 A1Seiko Epson Corporation
Most cited
By later US patents
- Ink jet head and a method of manufacturing thereof420US 5,666,141 ASharp Kabushiki Kaisha · 1997
- Ink-jet recording head with piezoelectric device and method for manufacturing the same368US 6,142,615 ASeiko Epson Corporation · 2000
- Polymer-based micromachining for microfluidic devices351US 6,136,212 AThe Regents of the University of Michigan · 2000
- Ink jet print device and print head or print apparatus using the same348US 6,019,457 ACanon Information Systems Research Australia Pty. Ltd. · 2000
- Method of fabricating bubblejet print devices using semiconductor fabrication techniques311US 5,841,452 ACanon Information Systems Research Australia Pty. Ltd. · 1998