B24D 11/003
Without embedded abrasive particles
Official title: {without embedded abrasive particles (B24D11/005 takes precedence)}
B24D11/003 (Without embedded abrasive particles) appears on 55 US grants and 72 published applications in this corpus.
Search patents in B24D- Granted patents
- 55
- Published applications
- 72
- Assignees
- 44
- Inventors
- 177
- Latest grant
- 6 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 1 | 2 |
| 2005 | 2 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 2 |
| 2008 | 0 | 3 |
| 2009 | 0 | 3 |
| 2010 | 1 | 3 |
| 2011 | 1 | 0 |
| 2012 | 1 | 5 |
| 2013 | 3 | 7 |
| 2014 | 5 | 5 |
| 2015 | 3 | 9 |
| 2016 | 6 | 6 |
| 2017 | 5 | 2 |
| 2018 | 2 | 2 |
| 2019 | 1 | 0 |
| 2020 | 2 | 2 |
| 2021 | 1 | 7 |
| 2022 | 2 | 2 |
| 2023 | 5 | 3 |
| 2024 | 3 | 2 |
| 2025 | 0 | 3 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Polishing pad with adjusted crosslinking degree and process for preparing the same6 Jan 2026US 12,515,294 B2Enpulse Co., Ltd.
- Conformable abrasive article29 Oct 2024US 12,128,526 B23M Innovative Properties Company
- Unique PDC microstructure and the method of making it1 Oct 2024US 12,104,111 B2Beijing Huamei, Inc.
- Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same19 Mar 2024US 11,931,856 B2SK enpulse Co., Ltd.
- Polishing pad, method for preparing the same, and chemical and mechanical polishing equipment12 Dec 2023US 11,839,945 B2Xi'an Eswin Material Technology Co., Ltd.
- Polishing pad, polishing apparatus, method for producing polishing pad and method for producing polished object11 Jun 2026US 2026/0158616 A1Canon Kabushiki Kaisha
- Window-mounted polishing pad and method of manufacturing the same10 Apr 2025US 2025/0114900 A1Kpx Chemical Co., Ltd.
- Nonwoven abrasive articles and methods of making the same6 Feb 2025US 2025/0041997 A13M Innovative Properties Company
- Conformable abrasive article16 Jan 2025US 2025/0018536 A13M Innovative Properties Company
- Pdc cutter with unique microstructure26 Dec 2024US 2024/0425736 A1Beijing Huamei, Inc.
Most cited
By later US patents
- Chemically machined sheet metal cutting tools and method104US 5,100,506 AGrace Manufacturing, Inc. · 1992
- Soft polishing pad for polishing a semiconductor substrate35US 9,156,124 B2NexPlanar Corporation · 2015
- Preformed abrasive articles and method for the manufacture of same27US 6,723,142 B2Tepco Ltd. · 2004
- Preformed abrasive articles and method for the manufacture of same27US 6,866,692 B2Tepco Ltd. · 2005
- Method of manufacturing chemical mechanical polishing layers27US 8,709,114 B2Rohm and Haas Electronic Materials CMP Holdings, Inc. · 2014