B24B 53/095
Cooling or lubricating during dressing operation
Official title: Cooling or lubricating during dressing operation (cooling the grinding surfaces B24B55/02)
B24B53/095 (Cooling or lubricating during dressing operation) appears on 21 US grants and 33 published applications in this corpus.
Search patents in B24B- Granted patents
- 21
- Published applications
- 33
- Assignees
- 28
- Inventors
- 82
- Latest grant
- 17 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 3 |
| 2004 | 1 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 2 |
| 2012 | 0 | 1 |
| 2013 | 1 | 3 |
| 2014 | 1 | 3 |
| 2015 | 1 | 0 |
| 2016 | 1 | 0 |
| 2017 | 1 | 3 |
| 2018 | 1 | 1 |
| 2019 | 0 | 1 |
| 2020 | 3 | 3 |
| 2021 | 1 | 2 |
| 2022 | 0 | 2 |
| 2023 | 1 | 2 |
| 2024 | 1 | 1 |
| 2025 | 0 | 3 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Dresser apparatus for dressing a grinding wheel17 Mar 2026US 12,576,477 B2Ncmt Limited
- Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing20 Jan 2026US 12,528,151 B2APPLIED Materials.Inc.
- Dressing apparatus and polishing apparatus14 May 2024US 11,980,997 B2Okamoto Machine Tool Works, Ltd.
- Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing14 Feb 2023US 11,577,358 B2APPLIED Materials.Inc.
- Dressing apparatus and dressing method for substrate rear surface polishing member13 Jul 2021US 11,059,145 B2Tokyo Electron Limited
- Method for dressing polishing pad, method for polishing silicon wafer, method for producing silicon wafer, and device for polishing silicon wafer20 Nov 2025US 2025/0353141 A1Sumco Corporation
- Disc Grinding for Semiconductor Wafers on Polishing System11 Sep 2025US 2025/0282021 A1Wolfspeed, Inc.
- Non-contact pad cleaning apparatus26 Jun 2025US 2025/0205850 A1Ebara Corporation
- Apparatuses and methods for finishing the edges of glass sheets26 Dec 2024US 2024/0424631 A1Corning Incorporated
- Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing15 Jun 2023US 2023/0182259 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Method of cooling and lubricating a tool and/or workpiece and a working spindle for carrying out the method43US 6,050,756 AHuller Hille GmbH · 2000
- Polishing pad conditioning system34US 6,508,697 B12003
- Optical dressing method, machining device based on this method, grindstone and polishing cloth10US 6,126,523 AThe Institute of Physical and Chemical Research · 2000
- Pad conditioner and method10US 8,398,463 B22013
- Method of increasing the service life of grinding wheels9US 5,961,376 AWernicke & Co. GmbH · 1999