Wafertech, LLC
Camas, WA, US· latest recorded location
WAFERTECH, LLC is named on 55 US grants and 50 published applications in this corpus. Its most frequent classification is H10D (Inorganic electric semiconductor devices).
- Granted patents
- 55
- Published applications
- 50
- Inventors
- 55
- Granted in 2026 so far
- 0
- Most recent grant
- 16 Nov 2021
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 2 | 0 |
| 2003 | 1 | 0 |
| 2004 | 1 | 1 |
| 2005 | 1 | 1 |
| 2006 | 2 | 1 |
| 2007 | 0 | 1 |
| 2008 | 0 | 1 |
| 2009 | 3 | 0 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 9 |
| 2013 | 6 | 10 |
| 2014 | 6 | 5 |
| 2015 | 6 | 11 |
| 2016 | 14 | 7 |
| 2017 | 3 | 1 |
| 2018 | 4 | 2 |
| 2019 | 1 | 0 |
| 2020 | 0 | 0 |
| 2021 | 1 | 0 |
By publication year.
Technology areas
Share of 105 documents
- H10DInorganic electric semiconductor devices50
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered45
- H10BElectronic memory devices28
- H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by21
- G03FPhotomechanical production of textured or patterned surfaces13
- Y02PLow-carbon manufacturing9
- C23CCoating metallic material8
- G05BControl or regulating systems in general7
- G01NInvestigating or analysing materials by determining their chemical or physical properties6
- G11CStatic stores6
Recent patents
- Solid state sensor for metal ion detection and trapping in solution16 Nov 2021US 11,175,257 B2
- Fluid monitoring system and method for semiconductor fabrication tools8 Oct 2019US 10,438,826 B2
- Inductor structures for integrated circuits13 Nov 2018US 10,128,325 B2
- Nonvolatile memory cell with improved isolation structures30 Oct 2018US 10,115,789 B2
- Solid state sensor for metal ion detection and trapping in solution4 Sep 2018US 10,067,084 B2
- Fluid monitoring system and method for semiconductor fabrication tools27 Dec 2018US 2018/0374728 A1
- Solid state sensor for metal ion detection and trapping in solution18 Oct 2018US 2018/0299402 A1
- Split gate embedded flash memory and method for forming the same9 Mar 2017US 2017/0069501 A1
- Nonvolatile memory cell with improved isolation structures17 Nov 2016US 2016/0336397 A1
- Fluid monitoring system and method for semiconductor fabrication tools23 Jun 2016US 2016/0178416 A1
Most cited
By later US patents
- Non-intrusive pellicle height measurement system8US 6,346,986 B12002
- Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gaps7US 6,365,015 B12002
- Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gaps6US 6,129,819 A2000
- Method and software for conducting efficient lithography WPH / lost time analysis in semiconductor manufacturing6US 7,489,982 B22009
- Method for depositing high density plasma chemical vapor deposition oxide with improved topography5US 6,251,795 B12001