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  1. Technology classes
  2. /Y · General tagging of new technological developments
  3. /Y10 · Technical subjects covered by former uspc
  4. /Y10S · Technical subjects covered by former uspc cross-reference art collections [xracs] and digests
  5. /Y10S 505/00 · Superconductor technology: apparatus, material, process
  6. /Y10S 505/825 · Apparatus per se, device per se, or process of making or operating
  7. /Y10S 505/826
Y10S 505/826

Coating

Y10S505/826 (Coating) appears on 15 US grants and 1 published applications in this corpus.

Search patents in Y10S

Where it sits

  1. YGeneral tagging of new technological developments
  2. Y10Technical subjects covered by former uspc
  3. Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests
  4. Y10S 505/00Superconductor technology: apparatus, material, process
  5. Y10S 505/825Apparatus per se, device per se, or process of making or operating
  6. Y10S 505/826Coating
Granted patents
15
Published applications
1
Assignees
11
Inventors
30
Latest grant
4 Aug 2009

Filings by year

Granted patentsPublished applications
Y10S 505/826: granted patents and published applications per publication year
YearGranted patentsPublished applications
197910
198000
198100
198200
198310
198400
198520
198610
198700
198800
198920
199000
199120
199210
199310
199410
199500
199600
199710
199800
199900
200000
200100
200200
200311
200400
200500
200600
200700
200800
200910

1979198919992009

By publication year. Applications have been published since 2001.

Recent patents

  • Apparatus and method for deposition of thin films4 Aug 2009US 7,569,494 B2Conductus, Inc.
  • Apparatus and method for deposition of thin films4 Mar 2003US 6,527,866 B1Conductus, Inc.
  • Process for sintering YBa.sub.2 Cu.sub.3 O.sub.x through wet grain-coating9 Dec 1997US 5,697,044 AKyushu University
  • Apparatus for forming a thin film with a mist forming means31 May 1994US 5,316,579 ASymetrix Corporation
  • Ceramic superconducting downlead2 Feb 1993US 5,183,965 A
  • Apparatus and method for deposition of thin films17 Apr 2003US 2003/0073324 A1Conductus, Inc.

Most cited

By later US patents
  • Plasma deposition apparatus166US 4,401,054 ANippon Telegraph & Telephone Public Corporation · 1983
  • Apparatus for forming a thin film with a mist forming means74US 5,316,579 ASymetrix Corporation · 1994
  • Apparatus and method for deposition of thin films73US 6,527,866 B1Conductus, Inc. · 2003
  • Chemical vapor deposition apparatus70US 4,545,327 AAnicon, Inc. · 1985
  • Chemical vapor deposition apparatus33US 4,539,933 AAnicon, Inc. · 1985

Top assignees

Documents
  • CConductus, Inc.3
  • AAnicon, Inc.2
  • BMBattelle Memorial Institute1
  • Eastman Kodak Company1
  • Kyushu University1
  • Massachusetts Institute of Technology1
  • NTNippon Telegraph & Telephone Public Corporation1
  • Sumitomo Electric Industries, Ltd.1
  • SSymetrix Corporation1
  • TITroy Investments Inc.1

Often classified with

  • C23CCoating metallic material8
  • H10NElectric solid-state devices not otherwise provided for8
  • C30BSingle-crystal growth2
  • H01JElectric discharge tubes or discharge lamps2
  • H10PGeneric processes or apparatus for the manufacture or treatment of devices covered2
  • B05CApparatus for applying fluent materials to surfaces, in general1
  • B05DProcesses for applying fluent materials to surfaces, in general1
  • B23HWorking of metal by the action of a high concentration of electric1
  • C04BLime, magnesia1
  • G02BOptical elements, systems or apparatus1

Documents that also carry the other class.

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