Apparatus and method for deposition of thin films

An apparatus comprising:

• (a) a holder for holding at least one substrate with a predetermined orientation;
• and
• (b) a deposition/reaction vessel comprising a plurality of alternating deposition and reaction zones, each deposition zone being separated from adjacent deposition and reaction zones by a wall, wherein each deposition zone is configured and arranged to deposit a different deposition material on the at least one substrate and each reaction zone is configured and arranged to react the deposition material deposited on the substrate with a reactant;
• and
• (c) a substrate heater,
• wherein the apparatus is configured and arranged to repeatedly rotate about an axis the at least one substrate sequentially through the plurality of alternating deposition and reaction zones, the axis being substantially parallel to the predetermined orientation.

An apparatus comprising:

• (a) a holder for holding at least one substrate with a predetermined orientation;
• and
• (b) a deposition/reaction vessel comprising a plurality of zones, each zone being separated from adjacent zones by a wall, the plurality of zones comprising
• (i) at least two deposition zones, wherein each deposition zone is configured and arranged to deposit a deposition material on the at least one substrate, and
• (ii) at least one reaction zone for reacting the deposition material on the at least one substrate with a reactant;
• wherein at least one of the reaction zones is configured and arranged to operate at a higher pressure than the deposition zones;
• and
• wherein the apparatus is configured and arranged to repeatedly rotate about an axis the at least one substrate sequentially through the plurality of zones, the axis being substantially parallel to the predetermined orientation.