Chemical vapor deposition apparatus

A quartz vacuum chamber base for a controlled temperature deposition chamber having an outer domed portion and an axially concentric inner cylinder portion integral therewith, the lower terminus of the outer dome portion comprising an outwardly extending annular mounting flange integrally joined to the sidewall thereof by a connecting wall portion having a thickness of at least 0.029 times the inside diameter of the lower terminus.

A controlled temperature deposition device comprising radiant heating means substantially surrounding an inner deposition reaction chamber for providing precisely controlled temperature conditions therein, the inner deposition reaction chamber having gas distribution means for introducing gas into the inner chamber and removing gas therefrom, and vacuum chamber means surrounding the inner deposition reaction chamber and spaced from the walls thereof for maintaining a medium vacuum therein, the vacuum chamber means comprising a domed housing and a base cooperating therewith, the material of the domed housing and base being substantially transparent to radiation, said radiant heating means being positioned over the outer surface of the domed housing and base for providing precisely controlled temperatures in the reaction chamber, the inner deposition chamber having a domed upper portion removably supported on a gas collector means, the gas collector means having a lower cylindrical portion removably supported on an annular support surface.

A controlled temperature deposition device comprising radiant heating means substantially surrounding an inner deposition reaction chamber for providing precisely controlled temperature conditions therein, the inner deposition reaction chamber having gas distribution means for introducing gas into the inner chamber and removing gas therefrom, and vacuum chamber means surrounding the inner deposition reaction chamber and spaced from the walls thereof for maintaining a medium vacuum therein, the inner deposition chamber being defined by a domed portion and a plate support means therefor, the support means having a central opening receiving a gas distributor, the flared inlet opening of the gas distributor forming a detachable, sealed engagement with a gas supply outlet means.

A controlled temperature deposition device comprising an inner deposition reaction chamber defined by containing walls, and having associated therewith gas distribution means for introducing gas into the inner deposition reaction chamber and for removing gas therefrom, vacuum chamber means surrounding the inner deposition reaction chamber and spaced from the walls thereof for maintaining a medium vacuum therein, the vacuum chamber means comprising a domed housing and a base cooperating therewith, the material of the domed housing and base being substantially transparent to radiation, said radiant heating means being positioned over outer surfaces of the domed housing and base surrounding the inner deposition chamber for providing precisely controlled temperatures in the reaction chamber, the radiant heating means and the outer surface of the domed housing and base being in a non-conducting relationship, wherein the resistance heating element means comprise a plurality of resistance heating elements, each resistance heating element having substantially the same cross-sectional area and length.