Chemical vapor deposition apparatus

A controlled temperature deposition device comprising radiant heating means substantially surrounding an inner deposition chamber for providing precisely controlled temperature conditions therein, the inner deposition reaction chamber having gas distribution means for introducing gas into the inner chamber and removing gas therefrom, and vacuum chamber means surrounding the inner deposition reaction chamber and spaced from the walls thereof for maintaining a medium vacuum therein, the inner deposition reaction chamber being defined by inner walls spaced apart from said vacuum chamber means, the inner walls being of a material substantially transparent to radiation, and a positive purging gas pressure means positioned between the vacuum chamber and the inner walls for preventing escape of gaseous components from the inner chamber.

A controlled temperature deposition device comprising an inner deposition reaction chamber means for containing reaction gases, radiant heating means substantially surrounding the inner deposition reaction chamber means for providing precisely controlled, isothermal temperature conditions therein, the inner deposition reaction chamber having gas distribution means for introducing gas into the inner deposition reaction chamber and removing gas therefrom, and vacuum chamber means surrounding the inner deposition reaction chamber and spaced from the walls thereof for maintaining a medium vacuum therein, the vacuum chamber means comprising a domed housing and a base cooperating therewith, the material of the domed housing and base being substantially transparent to radiation, said radiant heating means being positioned over the outer surface of the domed housing and base for providing precisely controlled temperatures in the reaction chamber, the housing and the base having sealing means associated therewith for effecting a vacuum seal therebetween, the sealing means having circulating fluid cooling means for preventing thermal damage to the seals thereof.