Y10S 156/913
Differential etching apparatus having a horizontal tube reactor
Y10S156/913 (Differential etching apparatus having a horizontal tube reactor) appears on 9 US grants and 0 published applications in this corpus.
Search patents in Y10S- Granted patents
- 9
- Published applications
- 0
- Assignees
- 10
- Inventors
- 25
- Latest grant
- 19 Sep 2000
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Apparatus and method for hermetically sealing a chamber19 Sep 2000US 6,120,611 ATaiwan Semiconductor Manufacturing Company.Ltd
- Apparatus and method for regulating pressure in two chambers22 Jun 1999US 5,913,978 ATokyo Electron Limited
- Plasma enhanced chemical vapor processing of semiconductor substrates6 Jul 1993US 5,225,375 AProcess Technology (1988) Limited
- Impurity doping apparatus6 Apr 1993US 5,199,994 ASeiko Instruments Inc.
- Transmission line for providing power to an electrode boat in a plasma enhanced chemical vapor deposition system29 Dec 1992US 5,175,021 AAdvanced Semiconductor Materials America, Inc.
No published applications in this class yet.
Most cited
By later US patents
- Apparatus and method for regulating pressure in two chambers161US 5,913,978 ATokyo Electron Limited · 1999
- In-situ CVD chamber cleaner78US 4,657,616 ABenzing Technologies, Inc. · 1987
- Plasma enhanced chemical vapor processing system using hollow cathode effect38US 5,133,986 AInternational Business Machines Corporation · 1992
- Glow discharge method and apparatus and photoreceptor devices made therewith12US 4,569,719 APlasma Physics Corp. · 1986
- Apparatus for producing semiconductor devices12US 4,920,920 AMitsubishi Denki Kabushiki Kaisha · 1990