Y10S 156/912
Differential etching apparatus having a vertical tube reactor
Y10S156/912 (Differential etching apparatus having a vertical tube reactor) appears on 21 US grants and 1 published applications in this corpus.
Search patents in Y10S- Granted patents
- 21
- Published applications
- 1
- Assignees
- 15
- Inventors
- 49
- Latest grant
- 3 May 2005
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 0 |
| 2003 | 2 | 1 |
| 2004 | 0 | 0 |
| 2005 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Vacuum plate having a symmetrical air-load block3 May 2005US 6,887,315 B2Jusung Engineering Co., Ltd.
- Method for plasma hardening photoresist in etching of semiconductor and superconductor films9 Dec 2003US 6,660,646 B1Northrop Grumman Corporation
- Inductive plasma reactor22 Apr 2003US 6,551,447 B1Mattson Technology, Inc.
- Substrate processing apparatus and substrate processing method26 Jun 2001US 6,251,189 B1Kokusai Electric Corporation
- Heat treatment system using ring-shaped radiation heater elements8 May 2001US 6,228,174 B1
Most cited
By later US patents
- Inductive plasma reactor330US 6,143,129 AMattson Technology, Inc. · 2000
- Inductive plasma reactor160US 5,811,022 AMattson Technology, Inc. · 1998
- Plasma processing apparatus etching tunnel-type60US 5,383,984 AKabushiki Kaisha Toshiba · 1995
- Vertical type processing apparatus57US 5,217,560 ATokyo Electron Limited · 1993
- Inductive plasma reactor50US 6,551,447 B1Mattson Technology, Inc. · 2003