Vertical type processing apparatus
AssigneesTokyo Electron Limited, Tokyo Electron Sagami Limited
InventorsYoichi Kurono, Shigeru Handa
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Abstract
An ashing apparatus of the vertical type comprises a reaction tube erected in the vertical direction to house therein a plurality of semiconductor wafers, an inner tube arranged in the reaction tube to enclose the semiconductor wafers and having a plurality of holes through which activated radicals in plasma can be selectively passed, a reaction gas supply pipe for supplying reaction gases into a space between the reaction tube and the inner tube, and plasma generating electrode unit located outside the reactor tube to generate plasma of the reaction gases only in the space between the reaction tube and the inner tube.
Claims13
A vertical type processing apparatus, comprising:
- a reaction tube erected in the vertical direction to house therein a plurality of objects to be processed;
- an inner tube arranged in the reaction tube to enclose the objects to be processed and having a plurality of holes through which activated radicals in plasma can be selectively passed;
- a plurality of pairs of high frequency electrodes arranged outside the reaction tube;
- and
- a means for supplying reaction gas into a space between the reaction tube and the inner tube;
- wherein said high frequency electrodes forming each pair are disposed adjacent to each other, and a high frequency electric field is formed between the reaction tube and the inner tube when a high frequency power is supplied to a space between the paired electrodes so as to generate a plasma of the reaction gas only in the space between the reaction tube and the inner tube.
Dependencies are inferred from the claim text.