H05H 2245/17
Exhaust gases
H05H2245/17 (Exhaust gases) appears on 73 US grants and 93 published applications in this corpus.
Search patents in H05H- Granted patents
- 73
- Published applications
- 93
- Assignees
- 69
- Inventors
- 236
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 4 | 0 |
| 2001 | 4 | 1 |
| 2002 | 2 | 3 |
| 2003 | 5 | 2 |
| 2004 | 2 | 9 |
| 2005 | 6 | 4 |
| 2006 | 3 | 1 |
| 2007 | 0 | 1 |
| 2008 | 2 | 3 |
| 2009 | 1 | 4 |
| 2010 | 0 | 6 |
| 2011 | 2 | 2 |
| 2012 | 1 | 1 |
| 2013 | 1 | 3 |
| 2014 | 2 | 2 |
| 2015 | 1 | 2 |
| 2016 | 4 | 0 |
| 2017 | 2 | 4 |
| 2018 | 1 | 0 |
| 2019 | 2 | 6 |
| 2020 | 2 | 4 |
| 2021 | 4 | 4 |
| 2022 | 1 | 5 |
| 2023 | 5 | 14 |
| 2024 | 4 | 5 |
| 2025 | 5 | 6 |
| 2026 | 4 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma device for treating exhaust gas26 May 2026US 12,641,705 B2Plasma Science System Co., Ltd.
- Systems and methods for ozone degradation for a plasma treatment system14 Apr 2026US 12,600,626 B2Illinois Tool Works Inc.
- Device for treating semiconductor process exhaust gas10 Mar 2026US 12,569,803 B2Plasma Science System Co., Ltd.
- Device for reducing pollutants in indoor air, ambient air, or exhaust gas by using nonthermal plasma6 Jan 2026US 12,515,168 B2Prime Solution, Inc.
- Gas treatment system and gas treatment method using the same26 Aug 2025US 12,400,879 B2Samsung Electronics Co., Ltd.
- Plasma generation device5 Mar 2026US 2026/0068023 A1Feagle Co., Ltd
- Plasma generating device25 Sep 2025US 2025/0299920 A1En2Core Technology, Inc.
- Apparatus, system and method for producing hydrogen peroxide, hydrocarbon(s) and syngas11 Sep 2025US 2025/0283227 A1The University of Sydney
- Methods and apparatus for decomposing constituent elements of fluids31 Jul 2025US 2025/0247941 A1TellaPure, LLC
- System And Methods For Plasma-Based Remediation19 Jun 2025US 2025/0196059 A1Tai Chong Cheang Steamship Co. (H.K.) Limited
Most cited
By later US patents
- Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment90US 6,193,802 B1APPLIED Materials.Inc. · 2001
- Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions71US 6,187,072 B1APPLIED Materials.Inc. · 2001
- Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment70US 6,045,618 AAPPLIED Materials.Inc. · 2000
- Method of manufacture of a plasma reactor with curved shape for treating auto emissions50US 6,354,903 B1Delphi Technologies, Inc. · 2002
- Pollution treatment cells energized by short pulses49US 5,603,893 AUniversity of Southern California · 1997