H05H 2242/26
Matching networks
H05H2242/26 (Matching networks) appears on 205 US grants and 224 published applications in this corpus.
Search patents in H05H- Granted patents
- 205
- Published applications
- 224
- Assignees
- 67
- Inventors
- 304
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 0 |
| 2003 | 1 | 0 |
| 2004 | 1 | 3 |
| 2005 | 0 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 7 |
| 2008 | 2 | 1 |
| 2009 | 0 | 4 |
| 2010 | 2 | 4 |
| 2011 | 2 | 3 |
| 2012 | 7 | 11 |
| 2013 | 5 | 25 |
| 2014 | 5 | 24 |
| 2015 | 29 | 30 |
| 2016 | 27 | 25 |
| 2017 | 36 | 22 |
| 2018 | 19 | 11 |
| 2019 | 12 | 10 |
| 2020 | 15 | 9 |
| 2021 | 7 | 7 |
| 2022 | 5 | 7 |
| 2023 | 11 | 8 |
| 2024 | 4 | 5 |
| 2025 | 6 | 3 |
| 2026 | 4 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Systems and methods for impedance matching in plasma creation at atmospheric pressure11 Aug 2026US 12,706,583 B2Surfx Technologies LLC
- Adjustment of power and frequency based on three or more states21 Apr 2026US 12,609,284 B2Lam Research Corporation
- Multicell or multiarray plasma and method for surface treatment using the same14 Apr 2026US 12,603,250 B2Institut SystèMes Industriels, Haute Ecole De Suisse Occidentale, Valais-Wallis (Hes-So)
- Apparatuses and methods involving frequency-selective power amplification10 Mar 2026US 12,573,987 B2The Board of Trustees of the Leland Stanford Junior University
- Method for controlling high-frequency power supply device, and high-frequency power supply device30 Dec 2025US 12,512,797 B2Kyosan Electric Mfg. Co., Ltd.
- Modulated pulsed microwave waveform in a power source for achieving a desired electron energy distribution in a plasma27 Aug 2026US 2026/0255468 A1Starfire Industries LLC
- Adjustment of power and frequency based on three or more states9 Jul 2026US 2026/0196444 A1Lam Research Corporation
- Methods and apparatus for controlling plasma in a plasma processing system6 Nov 2025US 2025/0343026 A1Lam Research Corporation
- Systems and methods for impedance matching in plasma creation at atmospheric pressure25 Sep 2025US 2025/0300620 A1Surfx Technologies LLC
- Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and plasma generation device15 May 2025US 2025/0154654 A1Kokusai Electric Corporation
Most cited
By later US patents
- Tissue resurfacing1,470US 7,335,199 B2Rhytec Limited · 2008
- Ratiometric autotuning algorithm for RF plasma generator101US 6,020,794 AENI Technologies, Inc. · 2000
- Adjustable non-dissipative voltage boosting snubber network80US 9,651,957 B1Advanced Energy Industries, Inc. · 2017
- Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages77US 9,520,269 B2Advanced Energy Industries, Inc. · 2016
- Frequency tuning for pulsed radio frequency plasma processing74US 9,852,890 B2Advanced Energy Industries, Inc. · 2017