Adjustment of power and frequency based on three or more states
AssigneeLam Research Corporation
InventorsJohn C. Valcore, Jr., Bradford J. Lyndaker
Life of this patent
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AssigneeLam Research Corporation
InventorsJohn C. Valcore, Jr., Bradford J. Lyndaker
Estimating the term…
Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having multiple states. The pulsed signal is received by multiple radio frequency (RF) generators. When the pulsed signal having a first state is received, an RF signal having a pre-set power level is generated by a first RF generator and an RF signal having a pre-set power level is generated by a second RF generator. Moreover, when the pulsed signal having a second state is received, RF signals having pre-set power levels are generated by the first and second RF generators. Furthermore, when the pulsed signal having a third state is received, RF signals having pre-set power levels are generated by the first and second RF generators.
A controller for pulsing radio frequency (RF) generators, comprising:
A controller system for pulsing radio frequency (RF) generators, comprising:
The controller of 18, the impedance matching circuit is configured to be coupled to a lower electrode of a plasma chamber.
Dependencies are inferred from the claim text.